Inventor
NICHOLLS MATTHEW C
US9 patents
Patents
9 patentsUS7138717B2Nov 21, 2006
HDP-based ILD capping layer
IBM19 citations91
US6716559B2Apr 6, 2004
Method and system for determining overlay tolerance
IBM16 citations82
US7372158B2May 13, 2008
HDP-based ILD capping layer
IBM8 citations72
US6967709B2Nov 22, 2005
Overlay and CD process window structure
IBM7 citations68
US6766507B2Jul 20, 2004
Mask/wafer control structure and algorithm for placement
IBM5 citations61
US6674516B2Jan 6, 2004
Method of photolithographic exposure dose control as a function of resist sensitivity
IBM4 citations60
US7538344B2May 26, 2009
Overlay and CD process window structure
IBM4 citations57
US7060626B2Jun 13, 2006
Multi-run selective pattern and etch wafer process
IBM5 citations55
US6856378B2Feb 15, 2005
Method of photolithographic exposure dose control as a function of resist sensitivity
IBM0 citations49