Inventor
MADRIAGA MANUEL
US28 patents
⚠️ This page may combine multiple inventors who share the name “MADRIAGA MANUEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
20 patentsUS7595869B1Sep 29, 2009
Optical metrology system optimized with a plurality of design goals
TOKYO ELECTRON LTD24 citations92
US7372583B1May 13, 2008
Controlling a fabrication tool using support vector machine
TOKYO ELECTRON LTD22 citations92
US7961306B2Jun 14, 2011
Optimizing sensitivity of optical metrology measurements
TOKYO ELECTRON LTD9 citations84
US7761178B2Jul 20, 2010
Automated process control using an optical metrology system optimized with design goals
TOKYO ELECTRON LTD16 citations84
US7761250B2Jul 20, 2010
Optical metrology system optimized with design goals
TOKYO ELECTRON LTD12 citations84
US7660696B1Feb 9, 2010
Apparatus for auto focusing a workpiece using two or more focus parameters
TOKYO ELECTRON LTD15 citations84
US7636649B2Dec 22, 2009
Automated process control of a fabrication tool using a dispersion function relating process parameter to dispersion
TOKYO ELECTRON LTD16 citations84
US7567352B2Jul 28, 2009
Controlling a fabrication tool using support vector machine
TOKYO ELECTRON LTD10 citations84
US7526354B2Apr 28, 2009
Managing and using metrology data for process and equipment control
TOKYO ELECTRON LTD10 citations84
US7417750B2Aug 26, 2008
Consecutive measurement of structures formed on a semiconductor wafer using an angle-resolved spectroscopic scatterometer
TOKYO ELECTRON LTD11 citations84
US7949618B2May 24, 2011
Training a machine learning system to determine photoresist parameters
TOKYO ELECTRON LTD10 citations82
US7742889B2Jun 22, 2010
Designing an optical metrology system optimized with signal criteria
TOKYO ELECTRON LTD9 citations82
US7734437B2Jun 8, 2010
Apparatus for designing an optical metrology system optimized with signal criteria
TOKYO ELECTRON LTD12 citations82
US7667858B2Feb 23, 2010
Automated process control using optical metrology and a correlation between profile models and key profile shape variables
TOKYO ELECTRON LTD9 citations82
US7627392B2Dec 1, 2009
Automated process control using parameters determined with approximation and fine diffraction models
TOKYO ELECTRON LTD12 citations82
US7589845B1Sep 15, 2009
Process control using an optical metrology system optimized with signal criteria
TOKYO ELECTRON LTD16 citations82
US7567353B2Jul 28, 2009
Automated process control using optical metrology and photoresist parameters
TOKYO ELECTRON LTD10 citations82
US7639351B2Dec 29, 2009
Automated process control using optical metrology with a photonic nanojet
TOKYO ELECTRON LTD4 citations63
US7522295B2Apr 21, 2009
Consecutive measurement of structures formed on a semiconductor wafer using a polarized reflectometer
TOKYO ELECTRON LTD4 citations63
US7480062B2Jan 20, 2009
Automated process control using parameters determined from a photomask covered by a pellicle
TOKYO ELECTRON LTD4 citations62
LI SHIFANG
3 patentsUS8289527B2Oct 16, 2012
Optimization of ray tracing and beam propagation parameters
LI SHIFANG20 citations92
US8838422B2Sep 16, 2014
Process control using ray tracing-based libraries and machine learning systems
LI SHIFANG6 citations72
US9103664B2Aug 11, 2015
Automated process control using an adjusted metrology output signal
LI SHIFANG1 citations51