Inventor
IKEDA KYOKO
JP18 patents
⚠️ This page may combine multiple inventors who share the name “IKEDA KYOKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
15 patentsUS7511814B2Mar 31, 2009
Particle-measuring system and particle-measuring method
TOKYO ELECTRON LTD10 citations92
US6532069B1Mar 11, 2003
Particle-measuring system and particle-measuring method
TOKYO ELECTRON LTD25 citations92
US7931945B2Apr 26, 2011
Film forming method
TOKYO ELECTRON LTD8 citations84
US7667840B2Feb 23, 2010
Particle-measuring system and particle-measuring method
TOKYO ELECTRON LTD9 citations84
US7515264B2Apr 7, 2009
Particle-measuring system and particle-measuring method
TOKYO ELECTRON LTD9 citations84
US7894059B2Feb 22, 2011
Film formation processing apparatus and method for determining an end-point of a cleaning process
TOKYO ELECTRON LTD6 citations73
US10786837B2Sep 29, 2020
Method for cleaning chamber of substrate processing apparatus
TOKYO ELECTRON LTD3 citations71
US11517943B2Dec 6, 2022
Cleaning method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations62
US10870916B2Dec 22, 2020
Gas supply member and gas processing apparatus
TOKYO ELECTRON LTD1 citations62
US11865590B2Jan 9, 2024
Substrate cleaning method, processing container cleaning method, and substrate processing device
TOKYO ELECTRON LTD0 citations58
US11504751B2Nov 22, 2022
Substrate cleaning method, processing container cleaning method, and substrate processing device
TOKYO ELECTRON LTD0 citations58
US11281116B2Mar 22, 2022
Substrate stage and substrate processing apparatus
TOKYO ELECTRON LTD0 citations58
US11761075B2Sep 19, 2023
Substrate cleaning apparatus
TOKYO ELECTRON LTD0 citations50
US9343295B2May 17, 2016
Vaporizing unit, film forming apparatus, film forming method, computer program and storage medium
TOKYO ELECTRON LTD1 citations49
US9939200B2Apr 10, 2018
Substrate transfer system and heat treatment apparatus using same
TOKYO ELECTRON LTD0 citations37