P

Inventor

IMAI YUJI

JP88 patents
⚠️ This page may combine multiple inventors who share the name “IMAI YUJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NIKON CORP

25 patents
US6195154B1Feb 27, 2001

Projection exposure apparatus for transferring mask pattern onto photosensitive substrate

NIKON CORP148 citations99
US5738165AApr 14, 1998

Substrate holding apparatus

NIKON CORP176 citations99
US5424552AJun 13, 1995

Projection exposing apparatus

NIKON CORP162 citations99
US5581324ADec 3, 1996

Thermal distortion compensated projection exposure method and apparatus for manufacturing semiconductors

NIKON CORP206 citations98
US5502311AMar 26, 1996

Method of and apparatus for detecting plane position

NIKON CORP136 citations98
US5461237AOct 24, 1995

Surface-position setting apparatus

NIKON CORP141 citations98
US6327025B1Dec 4, 2001

Projection exposure apparatus for transferring mask pattern onto photosensitive substrate

NIKON CORP59 citations96
US6137561AOct 24, 2000

Exposure apparatus for aligning photosensitive substrate with image plane of a projection optical system

NIKON CORP77 citations96
US6118515ASep 12, 2000

Scanning exposure method

NIKON CORP83 citations96
US5825470AOct 20, 1998

Exposure apparatus

NIKON CORP63 citations94
US6737207B2May 18, 2004

Method for evaluating lithography system and method for adjusting substrate-processing apparatus

NIKON CORP21 citations93
US6624879B2Sep 23, 2003

Exposure apparatus and method for photolithography

NIKON CORP23 citations93
US6117598ASep 12, 2000

Scanning exposure method with alignment during synchronous movement

NIKON CORP43 citations93
US5742067AApr 21, 1998

Exposure method and apparatus therefor

NIKON CORP32 citations93
US5661548AAug 26, 1997

Projection exposure method and apparatus including a changing system for changing the reference image-formation position used to generate a focus signal

NIKON CORP44 citations93
US5569930AOct 29, 1996

Substrate height position detecting apparatus wherein a stop plate transmits a pattern of oblique light beams which are reflected by the substrate

NIKON CORP32 citations93
US5483056AJan 9, 1996

Method of projecting exposure with a focus detection mechanism for detecting first and second amounts of defocus

NIKON CORP36 citations93
US6277533B1Aug 21, 2001

Scanning exposure method

NIKON CORP38 citations92
US6172373B1Jan 9, 2001

Stage apparatus with improved positioning capability

NIKON CORP44 citations92
US5510892AApr 23, 1996

Inclination detecting apparatus and method

NIKON CORP42 citations92
US5473166ADec 5, 1995

Inclination detecting apparatus having an intensity adjusting unit

NIKON CORP25 citations92
US5666205ASep 9, 1997

Measuring method and exposure apparatus

NIKON CORP25 citations91
US6287734B2Sep 11, 2001

Exposure method

NIKON CORP8 citations74
US5998801ADec 7, 1999

Surface position detecting method, surface position adjusting apparatus and projection exposure apparatus effecting accurate positioning of a substrate

NIKON CORP14 citations74
US5635722AJun 3, 1997

Projection exposure method and apparatus capable of performing focus detection with high accuracy

NIKON CORP16 citations74

OLYMPUS OPTICAL CO

10 patents

FUJITSU LTD

5 patents

TDK CORP

2 patents

NIPPON KOGAKU KK

2 patents

OLYMPUS CORP

2 patents

USHIO ELECTRIC INC

1 patent

NIXON CORP

1 patent

OLYMPUS IMAGING CORP

1 patent

SHIGETA SOICHI

1 patent

Showing the top 50 of 88 patents by PatentIndex Score.