P

Inventor

LERCH WILFRIED

DE15 patents
⚠️ This page may combine multiple inventors who share the name “LERCH WILFRIED”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

STEAG RTP SYSTEMS GMBH

3 patents
US6561694B1May 13, 2003

Method and device for calibrating measurements of temperatures independent of emissivity

STEAG RTP SYSTEMS GMBH30 citations92
US6953338B2Oct 11, 2005

Device for thermal treatment of substrates

STEAG RTP SYSTEMS GMBH23 citations86
US6830631B2Dec 14, 2004

Method for the removing of adsorbed molecules from a chamber

STEAG RTP SYSTEMS GMBH8 citations71

CENTROTHERM THERMAL SOLUTIONS GMBH & CO KG

3 patents
US9805993B2Oct 31, 2017

Device for determining the temperature of a substrate

CENTROTHERM THERMAL SOLUTIONS GMBH & CO KG2 citations58
US9711388B2Jul 18, 2017

Substrate holder and a device and a method for treating substrates

CENTROTHERM THERMAL SOLUTIONS GMBH & CO KG1 citations39
US9612158B2Apr 4, 2017

Device for determining the temperature of a substrate

CENTROTHERM THERMAL SOLUTIONS GMBH & CO KG0 citations39

LERCH WILFRIED

2 patents
US10867825B2Dec 15, 2020

Wafer boat and treatment apparatus for wafers

LERCH WILFRIED2 citations59
US8716153B2May 6, 2014

Device and method for producing dielectric layers in microwave plasma

LERCH WILFRIED3 citations51

AST ELECTRONIK GMBH

1 patent
US5727017AMar 10, 1998

Method and apparatus for determining emissivity of semiconductor material

AST ELECTRONIK GMBH77 citations93

(unassigned)

1 patent
US5935650AAug 10, 1999

Method of oxidation of semiconductor wafers in a rapid thermal processing (RTP) system

22 citations85

STEAG RTP SYSTEMS

1 patent
US6100149AAug 8, 2000

Method for rapid thermal processing (RTP) of silicon substrates

STEAG RTP SYSTEMS17 citations82

MATTSON TECH INC

1 patent
US7977258B2Jul 12, 2011

Method and system for thermally processing a plurality of wafer-shaped objects

MATTSON TECH INC11 citations80

PEUSE BRUCE W

1 patent
US8236706B2Aug 7, 2012

Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structures

PEUSE BRUCE W14 citations78

NIESS JUERGEN

1 patent
US9252011B2Feb 2, 2016

Method for forming a layer on a substrate at low temperatures

NIESS JUERGEN1 citations43

MATTSON THERMAL PRODUCTS GMBH

1 patent
US6809011B2Oct 26, 2004

Adjusting of defect profiles in crystal or crystalline-like structures

MATTSON THERMAL PRODUCTS GMBH0 citations38