Inventor

CHANG YA HUI

TW60 patents

⚠️ This page may combine multiple inventors who share the name “CHANG YA HUI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHANG YA HUI

TAIWAN SEMICONDUCTOR MFG CO LTD

Pattern fidelity enhancement

Pattern fidelity enhancement with directional patterning technology

Overlay measurement and compensation in semiconductor fabrication

Pattern fidelity enhancement

Landing metal etch process for improved overlay control

Directional processing to remove a layer or a material formed over a substrate

Photoresist and method of formation and use

Fine line patterning methods

Directional processing to remove a layer or a material formed over a substrate

Method of manufacturing a semiconductor device

Lithography alignment marks

Two-dimensional process window improvement

Method of lithography process with inserting scattering bars

Photoresist and method of formation and use

Photoresist and method of formation and use

Method of forming a semiconductor device

Pattern fidelity enhancement

Method of manufacturing semiconductor devices

Landing metal etch process for improved overlay control

Etch apparatus for compensating shifted overlayers

Directional deposition for semiconductor fabrication

Fine line patterning methods

Method of manufacturing semiconductor devices

Landing metal etch process for improved overlay control

Method of forming a semiconductor device

Directional deposition for semiconductor fabrication

Fine line patterning methods

Pattern fidelity enhancement with directional patterning technology

Directional deposition for semiconductor fabrication

System and method for multiple step directional patterning

Self-aligned cut-metal layer method

System and method for multiple step directional patterning

Critical dimension uniformity (CDU) control method and semiconductor substrate processing system

Methods for small trench patterning using chemical amplified photoresist compositions

Multiple edge enabled patterning

Device and methods for small trench patterning

TAIWAN SEMICONDUCTOR MFG

Photoresist and method of formation and use

Device and methods for small trench patterning

Methods for small trench patterning using chemical amplified photoresist compositions

Device and methods for small trench patterning

Structure design and fabrication on photomask for contact hole manufacturing process window enhancement

Multiple edge enabled patterning

CHANG YA HUI

Device and methods for forming partially self-aligned trenches

Device and methods for small trench patterning

Methods for small trench patterning using chemical amplified photoresist compositions

UNITED MICROELECTRONICS CORP

Method for forming via-first dual damascene interconnect structure

LIN LI-TE S

End-cut first approach for critical dimension control

SHIEH MING-FENG

Multiple edge enabled patterning

UNIV NAT TAIWAN SCIENCE TECH

Laminated optical disk

NOVATEK MICROELECTRONICS CORP

Gate driver structure of TFT-LCD display