Inventor
LIM MIN YOUNG
KR29 patents
⚠️ This page may combine multiple inventors who share the name “LIM MIN YOUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
LG CHEMICAL LTD
15 patentsUS7541073B2Jun 2, 2009
Alignment film for LCD using photoreactive polymer and LCD comprising the same
LG CHEMICAL LTD9 citations84
US11003077B2May 11, 2021
Positive photoresist composition, photoresist pattern using the same, and manufacturing method of the photoresist pattern
LG CHEMICAL LTD4 citations71
US7795361B2Sep 14, 2010
Photoreactive polymer and process of making the same
LG CHEMICAL LTD5 citations62
US7449574B2Nov 11, 2008
Triazine based photoactive compound containing oxime ester
LG CHEMICAL LTD2 citations61
US10990007B2Apr 27, 2021
Multi function photoacid generator and chemically amplified photoresist composition for thick layer comprising the same
LG CHEMICAL LTD0 citations60
US8357483B2Jan 22, 2013
Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin
LG CHEMICAL LTD2 citations60
US11537046B2Dec 27, 2022
Photoresist composition and photoresist film using the same
LG CHEMICAL LTD0 citations52
US7655284B2Feb 2, 2010
Multi-functional monomer having a photoreactive group, alignment film for LCD using the monomer, and LCD comprising the alignment film
LG CHEMICAL LTD1 citations52
US7422778B2Sep 9, 2008
Photoreactive compound, liquid crystal alignment layer using the compound, method of manufacturing the alignment layer, and liquid crystal display device containing the alignment layer
LG CHEMICAL LTD0 citations52
US8361696B2Jan 29, 2013
Polymer resin compounds and photoresist composition including new polymer resin compounds
LG CHEMICAL LTD0 citations51
US11531268B2Dec 20, 2022
Positive-working photoresist composition, pattern produced therefrom, and method for producing pattern
LG CHEMICAL LTD0 citations50
US11150555B2Oct 19, 2021
Photoacid generator and chemically amplified positive-type photoresist composition for thick film comprising the same
LG CHEMICAL LTD0 citations50
US8951713B2Feb 10, 2015
Alkali-soluble resin and negative-type photosensitive resin composition comprising the same
LG CHEMICAL LTD0 citations50
US11467493B2Oct 11, 2022
Chemically amplified photoresist composition and photoresist film using the same
LG CHEMICAL LTD0 citations48
US11042089B2Jun 22, 2021
Chemically amplified photoresist composition, photoresist pattern, and method for preparing photoresist pattern
LG CHEMICAL LTD0 citations48
KIM DAE HYUN
2 patentsCHEIL IND INC
2 patentsKIM HAN SOO
2 patentsUS8252879B2Aug 28, 2012
Photosensitive resin, method for preparing the resin, photosensitive resin composition and cured product of the resin composition
KIM HAN SOO1 citations50
US8535874B2Sep 17, 2013
Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same
KIM HAN SOO0 citations49
LIM MIN-YOUNG
2 patentsUS8323533B2Dec 4, 2012
Composition for manufacturing indurative resin, indurative resin manufactured by the composition and ink composition comprising the resin
LIM MIN-YOUNG0 citations35
US8304169B2Nov 6, 2012
Alkali-developable resins, method for preparing the same and photosensitive composition comprising the alkali-developable resins
LIM MIN-YOUNG0 citations34