Inventor
LOEVSKY BARRY
IL12 patents
⚠️ This page may combine multiple inventors who share the name “LOEVSKY BARRY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR CORP
10 patentsUS9182219B1Nov 10, 2015
Overlay measurement based on moire effect between structured illumination and overlay target
KLA TENCOR CORP23 citations92
US9123649B1Sep 1, 2015
Fit-to-pitch overlay measurement targets
KLA TENCOR CORP14 citations92
US10190979B2Jan 29, 2019
Metrology imaging targets having reflection-symmetric pairs of reflection-asymmetric structures
KLA TENCOR CORP12 citations83
US10209183B2Feb 19, 2019
Scatterometry system and method for generating non-overlapping and non-truncated diffraction images
KLA TENCOR CORP4 citations72
US9719920B2Aug 1, 2017
Scatterometry system and method for generating non-overlapping and non-truncated diffraction images
KLA TENCOR CORP2 citations72
US11060845B2Jul 13, 2021
Polarization measurements of metrology targets and corresponding target designs
KLA TENCOR CORP0 citations62
US9255787B1Feb 9, 2016
Measurement of critical dimension and scanner aberration utilizing metrology targets
KLA TENCOR CORP2 citations62
US10458777B2Oct 29, 2019
Polarization measurements of metrology targets and corresponding target designs
KLA TENCOR CORP0 citations52
US9429856B1Aug 30, 2016
Detectable overlay targets with strong definition of center locations
KLA TENCOR CORP0 citations51
US10352766B1Jul 16, 2019
Focusing modules and methods
KLA TENCOR CORP0 citations44