Inventor
MIKAMI MASAKI
JP16 patents
⚠️ This page may combine multiple inventors who share the name “MIKAMI MASAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASAHI GLASS CO LTD
9 patentsUS7906259B2Mar 15, 2011
Reflective mask blank for EUV lithography
ASAHI GLASS CO LTD27 citations92
US7833682B2Nov 16, 2010
Reflective mask blank for EUV lithography and substrate with functional film for the same
ASAHI GLASS CO LTD15 citations84
US7736821B2Jun 15, 2010
Reflective mask blank for EUV lithography and substrate with a conductive film for the mask blank
ASAHI GLASS CO LTD10 citations84
US9207529B2Dec 8, 2015
Reflective mask blank for EUV lithography, and process for its production
ASAHI GLASS CO LTD4 citations73
US9720316B2Aug 1, 2017
Reflective mask blank for EUV lithography and process for its production, as well as substrate with reflective layer for such mask blank and process for its production
ASAHI GLASS CO LTD2 citations72
US8828626B2Sep 9, 2014
Substrate with reflective layer for EUV lithography and reflective mask blank for EUV lithography
ASAHI GLASS CO LTD5 citations72
US9423684B2Aug 23, 2016
Reflective mask blank for EUV lithography and process for its production
ASAHI GLASS CO LTD6 citations71
US9052601B2Jun 9, 2015
Reflective mask blank for EUV lithography and process for its production, as well as substrate with reflective layer for such mask blank and process for its production
ASAHI GLASS CO LTD3 citations62
US9448469B2Sep 20, 2016
Reflective mask blank for EUV lithography, or reflective layer-coated substrate for EUV lithography, and process for its production
ASAHI GLASS CO LTD0 citations51
MIKAMI MASAKI
4 patentsUS8927179B2Jan 6, 2015
Optical member for EUV lithography, and process for production of reflective layer-equipped substrate
MIKAMI MASAKI5 citations71
US8993201B2Mar 31, 2015
Reflective layer-equipped substrate for EUV lithography, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and process for production of the reflective layer-equipped substrate
MIKAMI MASAKI2 citations59
US8580465B2Nov 12, 2013
Multilayer mirror for EUV lithography and process for its production
MIKAMI MASAKI2 citations59
US8986910B2Mar 24, 2015
Optical member for EUV lithography
MIKAMI MASAKI1 citations50