Inventor
FUJIMOTO SEIYA
JP26 patents
⚠️ This page may combine multiple inventors who share the name “FUJIMOTO SEIYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MINEBEA MITSUMI INC
8 patentsUS10428827B2Oct 1, 2019
Centrifugal fan with a casing including structure for engaging with an object to which the centrifugal fan is installed
MINEBEA MITSUMI INC3 citations71
US10914317B2Feb 9, 2021
Centrifugal fan
MINEBEA MITSUMI INC4 citations68
US12253108B2Mar 18, 2025
Motor
MINEBEA MITSUMI INC1 citations63
US11892033B2Feb 6, 2024
Motor
MINEBEA MITSUMI INC1 citations62
US10871171B2Dec 22, 2020
Centrifugal fan design to decrease noise and slim down the fan
MINEBEA MITSUMI INC1 citations60
US12088148B2Sep 10, 2024
Housing for an electric motor
MINEBEA MITSUMI INC0 citations51
US12057756B2Aug 6, 2024
Rotating Device
MINEBEA MITSUMI INC0 citations51
US10458424B2Oct 29, 2019
Centrifugal fan
MINEBEA MITSUMI INC0 citations49
MINEBEA CO LTD
7 patentsUS8384261B2Feb 26, 2013
Stepping motor including a connection structure of a stator yoke and a front plate
MINEBEA CO LTD26 citations90
US10316860B2Jun 11, 2019
Centrifugal fan having impeller with blades between annular shroud and main plate
MINEBEA CO LTD7 citations82
US10060440B2Aug 28, 2018
Centrifugal fan
MINEBEA CO LTD2 citations72
US9885367B2Feb 6, 2018
Centrifugal fan
MINEBEA CO LTD3 citations72
US9709073B2Jul 18, 2017
Centrifugal fan
MINEBEA CO LTD3 citations71
US9394920B2Jul 19, 2016
Centrifugal fan
MINEBEA CO LTD2 citations60
US9938986B2Apr 10, 2018
Centrifugal fan
MINEBEA CO LTD0 citations46
TOKYO ELECTRON LTD
4 patentsUS11862486B2Jan 2, 2024
Substrate liquid processing apparatus, substrate liquid processing method and recording medium
TOKYO ELECTRON LTD0 citations62
US10770316B2Sep 8, 2020
Substrate liquid processing apparatus, substrate liquid processing method and recording medium
TOKYO ELECTRON LTD0 citations51
US10685858B2Jun 16, 2020
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations51
US12300518B2May 13, 2025
Substrate processing apparatus and substrate processing method having enhanced configuration of replenishing processing liquid
TOKYO ELECTRON LTD0 citations41