Inventor
DANEN ROBERT M
US18 patents
⚠️ This page may combine multiple inventors who share the name “DANEN ROBERT M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR CORP
16 patentsUS9726617B2Aug 8, 2017
Apparatus and methods for finding a best aperture and mode to enhance defect detection
KLA TENCOR CORP20 citations91
US9696264B2Jul 4, 2017
Apparatus and methods for determining defect depths in vertical stack memory
KLA TENCOR CORP21 citations91
US7940384B2May 10, 2011
Systems and methods for blocking specular reflection and suppressing modulation from periodic features on a specimen
KLA TENCOR CORP7 citations83
US10887580B2Jan 5, 2021
Three-dimensional imaging for semiconductor wafer inspection
KLA TENCOR CORP8 citations82
US10338002B1Jul 2, 2019
Methods and systems for selecting recipe for defect inspection
KLA TENCOR CORP14 citations81
US11047806B2Jun 29, 2021
Defect discovery and recipe optimization for inspection of three-dimensional semiconductor structures
KLA TENCOR CORP8 citations78
US10317347B2Jun 11, 2019
Determining information for defects on wafers
KLA TENCOR CORP2 citations70
US9645093B2May 9, 2017
System and method for apodization in a semiconductor device inspection system
KLA TENCOR CORP3 citations69
US9176069B2Nov 3, 2015
System and method for apodization in a semiconductor device inspection system
KLA TENCOR CORP5 citations69
US10928740B2Feb 23, 2021
Three-dimensional calibration structures and methods for measuring buried defects on a three-dimensional semiconductor wafer
KLA TENCOR CORP0 citations60
US10957568B1Mar 23, 2021
Phase filter for enhanced defect detection in multilayer structure
KLA TENCOR CORP0 citations55
US10615067B2Apr 7, 2020
Phase filter for enhanced defect detection in multilayer structure
KLA TENCOR CORP1 citations55
US9523646B2Dec 20, 2016
Wafer and reticle inspection systems and methods for selecting illumination pupil configurations
KLA TENCOR CORP0 citations52
US9347891B2May 24, 2016
Wafer and reticle inspection systems and methods for selecting illumination pupil configurations
KLA TENCOR CORP1 citations52
US10132760B2Nov 20, 2018
Apparatus and methods for finding a best aperture and mode to enhance defect detection
KLA TENCOR CORP1 citations51
US10571407B2Feb 25, 2020
Determining information for defects on wafers
KLA TENCOR CORP0 citations49