Inventor
YOHANAN RAVIV
IL14 patents
⚠️ This page may combine multiple inventors who share the name “YOHANAN RAVIV”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR CORP
7 patentsUS10527951B2Jan 7, 2020
Compound imaging metrology targets
KLA TENCOR CORP18 citations85
US10303835B2May 28, 2019
Method and apparatus for direct self assembly in target design and production
KLA TENCOR CORP2 citations72
US10274837B2Apr 30, 2019
Metrology target for combined imaging and scatterometry metrology
KLA TENCOR CORP5 citations72
US10002806B2Jun 19, 2018
Metrology targets with filling elements that reduce inaccuracies and maintain contrast
KLA TENCOR CORP6 citations72
US11067904B2Jul 20, 2021
System for combined imaging and scatterometry metrology
KLA TENCOR CORP0 citations62
US10401841B2Sep 3, 2019
Identifying registration errors of DSA lines
KLA TENCOR CORP0 citations51
US11353493B2Jun 7, 2022
Data-driven misregistration parameter configuration and measurement system and method
KLA TENCOR CORP0 citations48
KLA CORP
7 patentsUS11355375B2Jun 7, 2022
Device-like overlay metrology targets displaying Moiré effects
KLA CORP6 citations74
US11532566B2Dec 20, 2022
Misregistration target having device-scaled features useful in measuring misregistration of semiconductor devices
KLA CORP2 citations72
US11862524B2Jan 2, 2024
Overlay mark design for electron beam overlay
KLA CORP2 citations71
US12111580B2Oct 8, 2024
Optical metrology utilizing short-wave infrared wavelengths
KLA CORP2 citations67
US12055859B2Aug 6, 2024
Overlay mark design for electron beam overlay
KLA CORP0 citations60
US11703767B2Jul 18, 2023
Overlay mark design for electron beam overlay
KLA CORP0 citations58
US11720031B2Aug 8, 2023
Overlay design for electron beam and scatterometry overlay measurements
KLA CORP0 citations50