Inventor

GARRETSON CHARLES C

US39 patents

⚠️ This page may combine multiple inventors who share the name “GARRETSON CHARLES C”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

GARRETSON CHARLES C

APPLIED MATERIALS INC

Pad conditioning disk

Retaining ring with shaped surface

Chemical mechanical polishing pad conditioning element with discrete points and compliant membrane

Retaining ring with shaped surface

Profile control platen

Carrier head with a modified flexible membrane

Method of post CMP defect stability improvement

Dynamic residue clearing control with in-situ profile control (ISPC)

Retaining ring monitoring and control of pressure

Retaining ring with shaped surface

Retaining ring with Shaped Surface

Retaining ring design

Control of processing parameters for substrate polishing with angularly distributed zones using cost function

Retaining ring with shaped surface

Textured small pad for chemical mechanical polishing

Chemical mechanical polishing automated recipe generation

Control of processing parameters for substrate polishing with substrate precession

Polishing head with local wafer pressure

Polishing head with local wafer pressure

Asymmetry correction via oriented wafer loading

Method of forming retaining ring with shaped surface

Retaining ring with shaped surface and method of forming

Asymmetry correction via oriented wafer loading

Retaining ring with shaped surface

Methods and apparatus for profile and surface preparation of retaining rings utilized in chemical mechanical polishing processes

Feedback for polishing rate correction in chemical mechanical polishing

Profile control platen

Machine learning for classifying retaining rings

Methods and apparatus for profile and surface preparation of retaining rings utilized in chemical mechanical polishing processes

Slurry flow rate monitoring in chemical-mechanical polisher using pressure transducer

Polishing system with local area rate control and oscillation mode

Local area polishing system and polishing pad assemblies for a polishing system

DHANDAPANI SIVAKUMAR

Closed-loop control for improved polishing pad profiles

Closed-loop control for effective pad conditioning

Method for compensation of variability in chemical mechanical polishing consumables

CHEN HUNG CHIH

Retaining ring with shaped surface

Retaining ring with shaped surface

QIAN JUN

Feedback for polishing rate correction in chemical mechanical polishing

Feedback for polishing rate correction in chemical mechanical polishing