Inventor
LU CHEN-HSIANG
TW25 patents
⚠️ This page may combine multiple inventors who share the name “LU CHEN-HSIANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
24 patentsUS9553090B2Jan 24, 2017
Structure and formation method of semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD30 citations98
US9899271B2Feb 20, 2018
Structure and formation method of semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD17 citations94
US9559205B2Jan 31, 2017
Structure and formation method of semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD23 citations94
US9450099B1Sep 20, 2016
Structure and formation method of semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD17 citations92
US10326005B2Jun 18, 2019
Structure and formation method of semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US9679850B2Jun 13, 2017
Method of fabricating semiconductor structure
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US10686059B2Jun 16, 2020
Structure of semiconductor device structure having fins
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11682716B2Jun 20, 2023
Structure of semiconductor device structure having fins
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12275832B2Apr 15, 2025
Fluorine-containing elastomer composition and method for making cured fluorine-containing elastomer composition
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US10867921B2Dec 15, 2020
Semiconductor structure with tapered conductor
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10686060B2Jun 16, 2020
Structure and formation method of semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10304774B2May 28, 2019
Semiconductor structure having tapered damascene aperture and method of the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10014394B2Jul 3, 2018
Structure and formation method of semiconductor device with metal gate
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9892957B2Feb 13, 2018
Semiconductor device structure and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9842765B2Dec 12, 2017
Semiconductor device structure and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9812549B2Nov 7, 2017
Formation method of semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9087793B2Jul 21, 2015
Method for etching target layer of semiconductor device in etching apparatus
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49
US12283526B2Apr 22, 2025
Edge fin trim process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations48
US12049697B2Jul 30, 2024
Multilayer ALD coating for critical components in process chamber
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations47
US11404250B2Aug 2, 2022
Plasma etcher edge ring with a chamfer geometry and impedance design
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations46
US9613816B2Apr 4, 2017
Advanced process control method for controlling width of spacer and dummy sidewall in semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations44
US9177875B2Nov 3, 2015
Advanced process control method for controlling width of spacer and dummy sidewall in semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations44
US10276469B2Apr 30, 2019
Method for forming semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations40
US9704714B2Jul 11, 2017
Method for controlling surface charge on wafer surface in semiconductor fabrication
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations40