Inventor
MLYNKO WALTER E
US11 patents
Patents
11 patentsUS6221775B1Apr 24, 2001
Combined chemical mechanical polishing and reactive ion etching process
IBM64 citations95
US6147394ANov 14, 2000
Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby
IBM54 citations95
US5312717AMay 17, 1994
Residue free vertical pattern transfer with top surface imaging resists
IBM78 citations95
US5972570AOct 26, 1999
Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby
IBM38 citations92
US4654115AMar 31, 1987
Process for removing contaminant
IBM22 citations80
US5610441AMar 11, 1997
Angle defined trench conductor for a semiconductor device
IBM15 citations74
US5672537ASep 30, 1997
Method for preparing a narrow angle defined trench in a substrate
IBM12 citations73
US4985112AJan 15, 1991
Enhanced plasma etching
IBM16 citations73
US4853081AAug 1, 1989
Process for removing contaminant
IBM4 citations62
US5053104AOct 1, 1991
Method of plasma etching a substrate with a gaseous organohalide compound
IBM6 citations60
US5110409AMay 5, 1992
Enhanced plasma etching
IBM0 citations52