Inventor

MAZURE CARLOS A

US28 patents

⚠️ This page may combine multiple inventors who share the name “MAZURE CARLOS A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MAZURE CARLOS A

MOTOROLA INC

Vertical transistor structure

Vertically stacked vertical transistors used to form vertical logic gate structures

Dynamic memory device having a vertical transistor

Vertically formed semiconductor random access memory device

Method of formation of transistor and logic gates

Temperature controlled process for the epitaxial growth of a film of material

Semiconductor memory device and method of formation

Vertical transistor having an underlying gate electrode contact

Method for forming pitch independent contacts and a semiconductor device having the same

Vertically oriented DRAM structure

Method for forming a transistor having a dynamic connection between a substrate and a channel region

Method for forming contact to a semiconductor device

Method for forming a vertically integrated dynamic memory cell

Method of formation of vertical transistor

Field effect transistor having a gate dielectric with variable thickness

Transistor and a capacitor used for forming a vertically stacked dynamic random access memory cell

Method for forming a grown bipolar electrode contact using a sidewall seed

ITLDD transistor having a variable work function

Method for forming a raised vertical transistor

ITLDD transistor having variable work function and method for fabricating the same

Method for forming vertical transistor structures having bipolar and MOS devices

Transistor useful for further vertical integration and method of formation

Method for forming a compact transistor structure

Method for forming a transistor and a capacitor for use in a vertically stacked dynamic random access memory cell

Method for forming a dynamic contact which can be either on or off or switched therebetween

Method for forming a bipolar transistor structure

INFINEON TECHNOLOGIES CORP

Isolation collar nitride liner for DRAM process improvement

SIEMENS AG

Process for fabricating a DRAM trench capacitor