Inventor
BLEIDISTEL SASCHA
DE35 patents
⚠️ This page may combine multiple inventors who share the name “BLEIDISTEL SASCHA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
20 patentsUS8811568B2Aug 19, 2014
Correction of optical elements by correction light irradiated in a flat manner
ZEISS CARL SMT GMBH5 citations84
US8786826B1Jul 22, 2014
Arrangement for actuating an element in a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH5 citations84
US7990622B2Aug 2, 2011
Projection objective of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH7 citations83
US10185221B2Jan 22, 2019
Arrangement for actuating an element in a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations73
US9568837B2Feb 14, 2017
Arrangement for actuating an element in a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH2 citations73
US9841682B2Dec 12, 2017
Arrangement for actuating an element in a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations62
US8027023B2Sep 27, 2011
Optical imaging device and method for reducing dynamic fluctuations in pressure difference
ZEISS CARL SMT GMBH2 citations62
US10908508B2Feb 2, 2021
Position measurement of optical elements in a lithographic apparatus
ZEISS CARL SMT GMBH1 citations59
US10509325B2Dec 17, 2019
Position measurement of optical elements in a lithographic apparatus
ZEISS CARL SMT GMBH1 citations59
US10578976B2Mar 3, 2020
Catadioptric projection objective including a reflective optical component and a measuring device
ZEISS CARL SMT GMBH0 citations52
US10054786B2Aug 21, 2018
Correction of optical elements by correction light irradiated in a flat manner
ZEISS CARL SMT GMBH0 citations52
US10012911B2Jul 3, 2018
Projection exposure apparatus with wavefront measuring device and optical wavefront manipulator
ZEISS CARL SMT GMBH1 citations52
US9366857B2Jun 14, 2016
Correction of optical elements by correction light irradiated in a flat manner
ZEISS CARL SMT GMBH0 citations52
US9581813B2Feb 28, 2017
Method for improving the imaging properties of a projection objective, and such a projection objective
ZEISS CARL SMT GMBH0 citations51
US9535336B2Jan 3, 2017
Microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations51
US9164396B2Oct 20, 2015
Projection lens system of a microlithographic projection exposure installation
ZEISS CARL SMT GMBH0 citations51
US10025200B2Jul 17, 2018
Optimum arrangement of actuator and sensor points on an optical element
ZEISS CARL SMT GMBH0 citations49
US10162267B2Dec 25, 2018
Projection exposure apparatus including mechanism to reduce influence of pressure fluctuations
ZEISS CARL SMT GMBH0 citations41
US10162270B2Dec 25, 2018
Projection exposure apparatus comprising a measuring system for measuring an optical element
ZEISS CARL SMT GMBH0 citations41
US10459351B2Oct 29, 2019
Device for transmitting electrical signals, and lithography apparatus
ZEISS CARL SMT GMBH0 citations39
BLEIDISTEL SASCHA
6 patentsUS8767176B2Jul 1, 2014
Microlithographic projection exposure apparatus
BLEIDISTEL SASCHA6 citations82
US10146137B2Dec 4, 2018
Catadioptric projection objective including a reflective optical component and a measuring device
BLEIDISTEL SASCHA2 citations72
US8760744B2Jun 24, 2014
Correction of optical elements by correction light irradiated in a flat manner
BLEIDISTEL SASCHA3 citations62
US8269948B2Sep 18, 2012
Projection exposure apparatus and optical system
BLEIDISTEL SASCHA5 citations62
US9110388B2Aug 18, 2015
Projection exposure apparatus with multiple sets of piezoelectric elements moveable in different directions and related method
BLEIDISTEL SASCHA0 citations51
US9366977B2Jun 14, 2016
Semiconductor microlithography projection exposure apparatus
BLEIDISTEL SASCHA0 citations40
ZEISS CARL SMT AG
3 patentsUS7830611B2Nov 9, 2010
Projection objective of a microlithographic projection exposure apparatus
ZEISS CARL SMT AG34 citations92
US7782440B2Aug 24, 2010
Projection lens system of a microlithographic projection exposure installation
ZEISS CARL SMT AG8 citations83
US7777963B2Aug 17, 2010
Method for improving the imaging properties of a projection objective, and such a projection objective
ZEISS CARL SMT AG3 citations62