Inventor

HAUF MARKUS

DE61 patents

⚠️ This page may combine multiple inventors who share the name “HAUF MARKUS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HAUF MARKUS

ZEISS CARL SMT GMBH

Device for controlling temperature of an optical element

Device for controlling temperature of an optical element

Projection objective of a microlithographic projection exposure apparatus

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

Device for controlling temperature of an optical element

Damping arrangement for dissipating oscillating energy of an element in a system, more particularly in a microlithographic projection exposure apparatus

Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus

Mirror array

Sensor device

Device for controlling temperature of an optical element

Method for determining properties of an EUV source

Arrangement for actuating an element in a projection exposure apparatus

Method and device for determining the heating state of an optical element in an optical system for microlithography

Arrangement for actuating at least one optical element in an optical system

Optical module for guiding a radiation beam

Arrangement for the thermal actuation of a mirror, in particular in a microlithographic projection exposure apparatus

Multi facet mirror of a microlithographic projection exposure apparatus

Multi facet mirror of a microlithographic projection exposure apparatus with a tilting actuator

Device for swiveling a mirror element with two degrees of swiveling freedom

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

Lithography device with eddy-current brake

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

HAUF MARKUS

Device for controlling temperature of an optical element

Optical correction device

Support structure and related assemblies and methods

Device for controlling temperature of an optical element

MATTSON TECH INC

Rapid thermal processing system for integrated circuits

Method and apparatus for thermally treating substrates

Apparatus and method for measuring the temperature of substrates

STEAG RTP SYSTEMS GMBH

Method and device for calibrating measurements of temperatures independent of emissivity

Device and method for thermally treating substrates

Apparatus and method for measuring the temperature of substrates

MATTSON THERMAL PRODUCTS GMBH

Method of producing a calibration wafer

Method and device for thermally treating objects

Process for determining the temperature of a semiconductor wafer in a rapid heating unit

ZEISS CARL SMT AG

Projection objective of a microlithographic projection exposure apparatus

Optical assembly, projection exposure apparatus and projection objective

STEAG AST

Method of measuring electromagnetic radiation

Optical radiation measurement apparatus

EVA ERIC

Optical element and method

Optical element and method

JANSEN BASTIAAN STEPHANUS HENDRICUS

Lithographic apparatus and thermal optical manipulator control method

Lithographic apparatus and thermal optical manipulator control method

SCHRIEVER MARTIN

Optical apparatus and method for modifying the imaging behavior of such apparatus

MATTSON THERMAL PRODUCTS

Method and device for thermal treatment of substrates

STEAG AST ELEKTRONIK GMBH

Method of measuring electromagnetic radiation

FIOLKA DAMIAN

Illumination optics for EUV microlithography and related system and apparatus

DINGER UDO

Projection illumination system for EUV microlithography