Inventor
KONG KEUN KYU
KR30 patents
⚠️ This page may combine multiple inventors who share the name “KONG KEUN KYU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HYNIX SEMICONDUCTOR INC
16 patentsUS7033729B2Apr 25, 2006
Light absorbent agent polymer for organic anti-reflective coating and preparation method and organic anti-reflective coating composition comprising the same
HYNIX SEMICONDUCTOR INC32 citations92
US6703323B2Mar 9, 2004
Method of inhibiting pattern collapse using a relacs material
HYNIX SEMICONDUCTOR INC49 citations92
US6984482B2Jan 10, 2006
Top-coating composition for photoresist and process for forming fine pattern using the same
HYNIX SEMICONDUCTOR INC6 citations74
US6664031B2Dec 16, 2003
Process for forming photoresist pattern by using gas phase amine treatment
HYNIX SEMICONDUCTOR INC7 citations74
US7749895B2Jul 6, 2010
Capacitor of semiconductor device and method for fabricating the same
HYNIX SEMICONDUCTOR INC3 citations63
US7582525B2Sep 1, 2009
Method for fabricating capacitor of semiconductor memory device using amorphous carbon
HYNIX SEMICONDUCTOR INC4 citations63
US7510973B2Mar 31, 2009
Method for forming fine pattern in semiconductor device
HYNIX SEMICONDUCTOR INC6 citations63
US7160668B2Jan 9, 2007
Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same
HYNIX SEMICONDUCTOR INC5 citations63
US7563753B2Jul 21, 2009
Cleaning solution for removing photoresist
HYNIX SEMICONDUCTOR INC2 citations62
US6787285B2Sep 7, 2004
Pattern width slimming-inhibiting method of photoresist pattern using photoresist composition containing thermal acid generator
HYNIX SEMICONDUCTOR INC4 citations59
US7510979B2Mar 31, 2009
Method for forming a pattern on a semiconductor device and semiconductor device resulting from the same
HYNIX SEMICONDUCTOR INC0 citations52
US7329477B2Feb 12, 2008
Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same
HYNIX SEMICONDUCTOR INC1 citations52
US7285370B2Oct 23, 2007
Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same
HYNIX SEMICONDUCTOR INC0 citations52
US7208260B2Apr 24, 2007
Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the same
HYNIX SEMICONDUCTOR INC1 citations52
US7186496B2Mar 6, 2007
Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same
HYNIX SEMICONDUCTOR INC0 citations52
US7674708B2Mar 9, 2010
Method for forming fine patterns of a semiconductor device
HYNIX SEMICONDUCTOR INC0 citations42
HYUNDAI ELECTRONICS IND
12 patentsUS6455225B1Sep 24, 2002
Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the same
HYUNDAI ELECTRONICS IND465 citations99
US6368773B1Apr 9, 2002
Photoresist cross-linker and photoresist composition comprising the same
HYUNDAI ELECTRONICS IND473 citations98
US6395451B1May 28, 2002
Photoresist composition containing photo base generator with photo acid generator
HYUNDAI ELECTRONICS IND48 citations93
US6165672ADec 26, 2000
Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin
HYUNDAI ELECTRONICS IND24 citations93
US6764806B2Jul 20, 2004
Over-coating composition for photoresist, and processes for forming photoresist patterns using the same
HYUNDAI ELECTRONICS IND17 citations84
US6322948B1Nov 27, 2001
Photoresist cross-linker and photoresist composition comprising the same
HYUNDAI ELECTRONICS IND15 citations84
US6291131B1Sep 18, 2001
Monomers for photoresist, polymers thereof, and photoresist compositions using the same
HYUNDAI ELECTRONICS IND18 citations84
US6482565B1Nov 19, 2002
Photoresist cross-linker and photoresist composition comprising the same
HYUNDAI ELECTRONICS IND11 citations73
US6312868B1Nov 6, 2001
Photoresist cross-linker and photoresist composition comprising the same
HYUNDAI ELECTRONICS IND14 citations73
US6770720B2Aug 3, 2004
Organic polymer for organic anti-reflective coating layer and preparation thereof
HYUNDAI ELECTRONICS IND3 citations63
US6593446B1Jul 15, 2003
Organic polymer for organic anti-reflective coating layer and preparation thereof
HYUNDAI ELECTRONICS IND4 citations63
US6399792B2Jun 4, 2002
Photoresist cross-linker and photoresist composition comprising the same
HYUNDAI ELECTRONICS IND0 citations51