Inventor
TAKAOKA OSAMU
JP22 patents
⚠️ This page may combine multiple inventors who share the name “TAKAOKA OSAMU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SII NANOTECHNOLOGY INC
14 patentsUS7375352B2May 20, 2008
Photomask defect correction method employing a combined device of a focused electron beam device and an atomic force microscope
SII NANOTECHNOLOGY INC9 citations83
US7189655B2Mar 13, 2007
Method of correcting amplitude defect in multilayer film of EUVL mask
SII NANOTECHNOLOGY INC18 citations83
US7018683B2Mar 28, 2006
Electron beam processing method
SII NANOTECHNOLOGY INC16 citations83
US7571639B2Aug 11, 2009
Method of correcting opaque defect of photomask using atomic force microscope fine processing device
SII NANOTECHNOLOGY INC4 citations63
US7285792B2Oct 23, 2007
Scratch repairing processing method and scanning probe microscope (SPM) used therefor
SII NANOTECHNOLOGY INC4 citations63
US7278299B2Oct 9, 2007
Method of processing vertical cross-section using atomic force microscope
SII NANOTECHNOLOGY INC2 citations63
US7259372B2Aug 21, 2007
Processing method using probe of scanning probe microscope
SII NANOTECHNOLOGY INC4 citations63
US7107826B2Sep 19, 2006
Scanning probe device and processing method by scanning probe
SII NANOTECHNOLOGY INC6 citations63
US7378654B2May 27, 2008
Processing probe
SII NANOTECHNOLOGY INC0 citations52
US7232995B2Jun 19, 2007
Method of removing particle of photomask using atomic force microscope
SII NANOTECHNOLOGY INC1 citations52
US7927769B2Apr 19, 2011
Method for fabricating EUVL mask
SII NANOTECHNOLOGY INC1 citations51
US7804067B2Sep 28, 2010
Method of observing and method of working diamond stylus for working of atomic force microscope
SII NANOTECHNOLOGY INC0 citations51
US7323685B2Jan 29, 2008
Ion beam processing method
SII NANOTECHNOLOGY INC0 citations51
US7442925B2Oct 28, 2008
Working method using scanning probe
SII NANOTECHNOLOGY INC0 citations49
SEIKO INSTR INC
5 patentsUS6037589AMar 14, 2000
Electron beam device
SEIKO INSTR INC45 citations92
US6703626B2Mar 9, 2004
Mask defect repair method
SEIKO INSTR INC13 citations83
US6544692B1Apr 8, 2003
Black defect correction method and black defect correction device for photomask
SEIKO INSTR INC10 citations73
US6467426B1Oct 22, 2002
Photomask correction device
SEIKO INSTR INC6 citations62
US6335530B1Jan 1, 2002
Objective lens for scanning electron microscope
SEIKO INSTR INC4 citations62