Inventor
KISHIMURA SHINJI
JP57 patents
⚠️ This page may combine multiple inventors who share the name “KISHIMURA SHINJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD
18 patentsUS6632582B2Oct 14, 2003
Pattern formation material and pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD14 citations84
US6528240B1Mar 4, 2003
Pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD10 citations74
US6521393B1Feb 18, 2003
Pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD10 citations74
US7169530B2Jan 30, 2007
Polymer compound, resist material and pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD8 citations73
US7078147B2Jul 18, 2006
Polymers, resist compositions and patterning process
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD6 citations63
US6753132B2Jun 22, 2004
Pattern formation material and pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD2 citations63
US6673523B2Jan 6, 2004
Pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD5 citations63
US6645694B2Nov 11, 2003
Pattern formation material and pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD2 citations63
US6511786B2Jan 28, 2003
Pattern formation material and pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD2 citations63
US6475706B1Nov 5, 2002
Pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD3 citations63
US6444395B1Sep 3, 2002
Pattern formation material and method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD2 citations63
US7378216B2May 27, 2008
Resist material and pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD2 citations62
US7166418B2Jan 23, 2007
Sulfonamide compound, polymer compound, resist material and pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD2 citations62
US7060775B2Jun 13, 2006
Polymer compound, resist material and pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD6 citations62
US7413843B2Aug 19, 2008
Sulfonamide compound, polymer compound, resist material and pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD0 citations52
US6689536B2Feb 10, 2004
Pattern formation material and pattern formation method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD0 citations52
US6576398B2Jun 10, 2003
Pattern formation material and method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD1 citations52
US6531259B1Mar 11, 2003
Pattern formation method and pattern formation material
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD1 citations52
SHINETSU CHEMICAL CO
13 patentsUS6875556B2Apr 5, 2005
Resist compositions and patterning process
SHINETSU CHEMICAL CO20 citations93
US6710148B2Mar 23, 2004
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO20 citations93
US6511787B2Jan 28, 2003
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO25 citations93
US6872514B2Mar 29, 2005
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO13 citations84
US6582880B2Jun 24, 2003
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO14 citations84
US6864037B2Mar 8, 2005
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO11 citations74
US6824955B2Nov 30, 2004
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO7 citations74
US6861197B2Mar 1, 2005
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO6 citations63
US6790586B2Sep 14, 2004
Resist compositions and patterning process
SHINETSU CHEMICAL CO4 citations63
US6461790B1Oct 8, 2002
Polymers, chemical amplification resist compositions and patterning process
SHINETSU CHEMICAL CO5 citations63
US6855477B2Feb 15, 2005
Chemically amplified resist compositions and patterning process
SHINETSU CHEMICAL CO1 citations52
US6660447B2Dec 9, 2003
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO0 citations52
US6603037B2Aug 5, 2003
Ester compounds
SHINETSU CHEMICAL CO0 citations52
CENTRAL GLASS CO LTD
11 patentsUS7067231B2Jun 27, 2006
Polymers, resist compositions and patterning process
CENTRAL GLASS CO LTD19 citations93
US7125643B2Oct 24, 2006
Polymers, resist compositions and patterning process
CENTRAL GLASS CO LTD11 citations84
US7125641B2Oct 24, 2006
Polymers, resist compositions and patterning process
CENTRAL GLASS CO LTD13 citations84
US6916592B2Jul 12, 2005
Esters, polymers, resist compositions and patterning process
CENTRAL GLASS CO LTD16 citations84
US7241553B2Jul 10, 2007
Polymer, resist composition, and patterning process
CENTRAL GLASS CO LTD4 citations63
US7125642B2Oct 24, 2006
Sulfonates, polymers, resist compositions and patterning process
CENTRAL GLASS CO LTD6 citations63
US7005228B2Feb 28, 2006
Polymers, resist compositions and patterning process
CENTRAL GLASS CO LTD2 citations63
US7001707B2Feb 21, 2006
Resist compositions and patterning process
CENTRAL GLASS CO LTD2 citations63
US6946235B2Sep 20, 2005
Polymers, resist compositions and patterning process
CENTRAL GLASS CO LTD4 citations63
US6933095B2Aug 23, 2005
Polymers, resist compositions and patterning process
CENTRAL GLASS CO LTD3 citations63
US7169869B2Jan 30, 2007
Polymers, resist compositions and patterning process
CENTRAL GLASS CO LTD1 citations52
MITSUBISHI ELECTRIC CORP
8 patentsUS5591654AJan 7, 1997
Method of manufacturing a semiconductor device and a resist composition used therein
MITSUBISHI ELECTRIC CORP21 citations92
US5123998AJun 23, 1992
Method of forming patterns
MITSUBISHI ELECTRIC CORP20 citations82
US6124081ASep 26, 2000
Method of forming a resist pattern
MITSUBISHI ELECTRIC CORP12 citations74
US5648199AJul 15, 1997
Method of forming a resist pattern utilizing an acid water-soluble material overlayer on the resist film
MITSUBISHI ELECTRIC CORP7 citations74
US5426016AJun 20, 1995
Method of forming and removing resist pattern
MITSUBISHI ELECTRIC CORP8 citations74
US5905016AMay 18, 1999
Resist pattern forming method and resist material
MITSUBISHI ELECTRIC CORP4 citations63
US5252433AOct 12, 1993
Method of forming and removing resist pattern
MITSUBISHI ELECTRIC CORP4 citations63
US5217851AJun 8, 1993
Pattern forming method capable of providing an excellent pattern of high resolution power and high sensitivity
MITSUBISHI ELECTRIC CORP6 citations54
Showing the top 50 of 57 patents by PatentIndex Score.