Inventor

HOLDERER HUBERT

DE61 patents

⚠️ This page may combine multiple inventors who share the name “HOLDERER HUBERT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HOLDERER HUBERT

ZEISS CARL SMT AG

Projection objective of a microlithographic projection exposure apparatus

Adjustment arrangement of an optical element

Projection lens and microlithographic projection exposure apparatus

Composite structure for microlithography and optical arrangement

Imaging device in a projection exposure facility

Holding and positioning apparatus for an optical element

Microlithographic projection exposure apparatus

Imaging device in a projection exposure machine

Facet mirror having a number of mirror facets

Method for correcting oscillation-induced imaging errors in an objective

Optical component and method of inducing a desired alteration of an optical property therein

Imaging device in a projection exposure machine

Facet mirror having a number of mirror facets

Device for holding a beam splitter element

Apparatus for positioning an optical element in a structure

Adjustment arrangement of an optical element

Adjustment arrangement of an optical element

Catadioptric objective

Projection method including pupillary filtering and a projection lens therefor

Projection method including pupillary filtering and a projection lens therefor

Apparatus for positioning an optical element in a structure

Apparatus for mounting two or more elements and method for processing the surface of an optical element

ZEISS STIFTUNG

Optical arrangement

Optical system, especially a projection light facility for microlithography

Assembly of optical element and mount

Optical arrangement

Optical system

Optical systems and methods of compensating rotationally non-symmetrical image defects in an optical system

Optical arrangement having improved temperature distribution within an optical element

Optical arrangement

Galvanoplastic optical mounting

Adjustable assembly

Galvanoplastic optical mounting

UV-resistant jointing technique for lenses and mounts

Soldering process for optical materials to metal mountings, and mounted assemblies

Assembly comprising an optical element and a mount

ZEISS CARL SMT GMBH

Projection objective of a microlithographic projection exposure apparatus

Imaging device in a projection exposure facility

Method for producing an illumination system for an EUV projection exposure system, and illumination system

Optical imaging device with thermal attenuation

Optical imaging device with thermal attenuation

Method for producing an illumination system for an EUV projection exposure system, and illumination system

Imaging optical unit for EUV microlithography

WEBER ULRICH

Holding arrangement for an optical element

Holding arrangement for an optical element

ZEISS CARL SEMICONDUCTOR MFG

Projection exposure system as well as a process for compensating image defects occuring in the projection optics of a projection exposure system, in particular for microlithography

Mount for an optical element in an optical imaging device

ZEISS CARL

Device for displacing an optical element along the optical axis

ZEISS CARL LASER OPTICS GMBH

Reflective optical element for use in an EUV system

EIFLER DIETMAR

Method of welding an optical component to a metal attachment element and an optical assembly incorporating the metal attachment element