Inventor
BITTNER BORIS
DE40 patents
⚠️ This page may combine multiple inventors who share the name “BITTNER BORIS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
33 patentsUS9170497B2Oct 27, 2015
Projection exposure apparatus with at least one manipulator
ZEISS CARL SMT GMBH7 citations83
US7990622B2Aug 2, 2011
Projection objective of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH7 citations83
US9939730B2Apr 10, 2018
Optical assembly
ZEISS CARL SMT GMBH7 citations82
US11112543B2Sep 7, 2021
Optical element having a coating for influencing heating radiation and optical arrangement
ZEISS CARL SMT GMBH2 citations73
US10401540B2Sep 3, 2019
Optical element having a coating for influencing heating radiation and optical arrangement
ZEISS CARL SMT GMBH3 citations73
US10303063B2May 28, 2019
Projection exposure apparatus with at least one manipulator
ZEISS CARL SMT GMBH1 citations72
US10061206B2Aug 28, 2018
Projection lens with wave front manipulator and related method and apparatus
ZEISS CARL SMT GMBH3 citations72
US10018907B2Jul 10, 2018
Method of operating a microlithographic projection apparatus
ZEISS CARL SMT GMBH2 citations72
US9760019B2Sep 12, 2017
Projection exposure apparatus comprising a manipulator, and method for controlling a projection exposure apparatus
ZEISS CARL SMT GMBH6 citations72
US10151922B2Dec 11, 2018
Wavefront correction element for use in an optical system
ZEISS CARL SMT GMBH3 citations71
US9910364B2Mar 6, 2018
Projection exposure apparatus including at least one mirror
ZEISS CARL SMT GMBH3 citations71
US10001631B2Jun 19, 2018
Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element
ZEISS CARL SMT GMBH6 citations70
US9927714B2Mar 27, 2018
Projection exposure apparatus with at least one manipulator
ZEISS CARL SMT GMBH3 citations70
US9377694B2Jun 28, 2016
Projection arrangement
ZEISS CARL SMT GMBH2 citations63
US12025818B2Jul 2, 2024
Optical element having a coating for influencing heating radiation and optical arrangement
ZEISS CARL SMT GMBH0 citations62
US10474036B2Nov 12, 2019
Optical element and optical arrangement therewith
ZEISS CARL SMT GMBH1 citations62
US10261425B2Apr 16, 2019
Projection exposure apparatus with a highly flexible manipulator
ZEISS CARL SMT GMBH1 citations62
US9164402B2Oct 20, 2015
Method of operating a microlithographic projection exposure apparatus and projection objective of such an apparatus
ZEISS CARL SMT GMBH2 citations62
US9494868B2Nov 15, 2016
Lithographic projection objective
ZEISS CARL SMT GMBH2 citations60
US9134613B2Sep 15, 2015
Illumination and displacement device for a projection exposure apparatus
ZEISS CARL SMT GMBH3 citations59
US9846367B2Dec 19, 2017
Projection exposure apparatus with at least one manipulator
ZEISS CARL SMT GMBH1 citations56
US9423696B2Aug 23, 2016
Projection exposure apparatus with optimized adjustment possibility
ZEISS CARL SMT GMBH0 citations52
US9817316B2Nov 14, 2017
Projection exposure method and projection exposure apparatus for microlithography
ZEISS CARL SMT GMBH1 citations51
US10054860B2Aug 21, 2018
Projection exposure apparatus with optimized adjustment possibility
ZEISS CARL SMT GMBH0 citations50
US9709770B2Jul 18, 2017
Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus
ZEISS CARL SMT GMBH0 citations50
US9348234B2May 24, 2016
Microlithographic apparatus
ZEISS CARL SMT GMBH1 citations50
US9052609B2Jun 9, 2015
Projection exposure apparatus with optimized adjustment possibility
ZEISS CARL SMT GMBH0 citations50
US10042265B2Aug 7, 2018
Lithographic projection objective
ZEISS CARL SMT GMBH0 citations49
US9829800B2Nov 28, 2017
System correction from long timescales
ZEISS CARL SMT GMBH0 citations49
US9470872B2Oct 18, 2016
Reflective optical element
ZEISS CARL SMT GMBH1 citations48
US9372411B2Jun 21, 2016
Projection objective of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations48
US10754132B2Aug 25, 2020
Imaging optical system for microlithography
ZEISS CARL SMT GMBH0 citations41
US9606446B2Mar 28, 2017
Reflective optical element for EUV lithography and method of manufacturing a reflective optical element
ZEISS CARL SMT GMBH0 citations40
BITTNER BORIS
3 patentsUS8203696B2Jun 19, 2012
Projection exposure apparatus with optimized adjustment possibility
BITTNER BORIS20 citations89
US9354524B2May 31, 2016
Projection exposure apparatus with optimized adjustment possibility
BITTNER BORIS1 citations59
US9235143B2Jan 12, 2016
Microlithographic projection exposure apparatus
BITTNER BORIS0 citations40