Inventor
NASMAN RONALD
US24 patents
⚠️ This page may combine multiple inventors who share the name “NASMAN RONALD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
20 patentsUS9718082B2Aug 1, 2017
Inline dispense capacitor
TOKYO ELECTRON LTD12 citations82
US10035113B2Jul 31, 2018
Method and system for a spiral mixer
TOKYO ELECTRON LTD2 citations73
US10403501B2Sep 3, 2019
High-purity dispense system
TOKYO ELECTRON LTD3 citations71
US9987655B2Jun 5, 2018
Inline dispense capacitor system
TOKYO ELECTRON LTD3 citations71
US12341053B2Jun 24, 2025
System for backside deposition of a substrate
TOKYO ELECTRON LTD0 citations62
US11908728B2Feb 20, 2024
System for backside deposition of a substrate
TOKYO ELECTRON LTD0 citations62
US11360388B2Jun 14, 2022
Critical dimension correction via calibrated trim dosing
TOKYO ELECTRON LTD1 citations62
US9523151B2Dec 20, 2016
Vaporizer unit with open cell core and method of operating
TOKYO ELECTRON LTD2 citations62
US7959775B2Jun 14, 2011
Thermal stress-failure-resistant dielectric windows in vacuum processing systems
TOKYO ELECTRON LTD2 citations62
US11920782B2Mar 5, 2024
Streamlined vaporizer cores
TOKYO ELECTRON LTD0 citations61
US10712663B2Jul 14, 2020
High-purity dispense unit
TOKYO ELECTRON LTD1 citations60
US12447513B2Oct 21, 2025
Gas cabinet with reduced gas emissions and exhaust flow rate
TOKYO ELECTRON LTD0 citations51
US8344300B2Jan 1, 2013
Device to reduce shadowing during radiative heating of a substrate
TOKYO ELECTRON LTD0 citations51
US12506019B2Dec 23, 2025
Wafer chuck designs and methods for retaining a processing liquid on a surface of a semiconductor wafer
TOKYO ELECTRON LTD0 citations47
US12103052B2Oct 1, 2024
Method and single wafer processing system for processing of semiconductor wafers
TOKYO ELECTRON LTD0 citations46
US10685857B2Jun 16, 2020
Dispense nozzle with a shielding device
TOKYO ELECTRON LTD0 citations41
US10426001B2Sep 24, 2019
Processing system for electromagnetic wave treatment of a substrate at microwave frequencies
TOKYO ELECTRON LTD0 citations41
US10256121B2Apr 9, 2019
Heated stage with variable thermal emissivity method and apparatus
TOKYO ELECTRON LTD0 citations41
US10354872B2Jul 16, 2019
High-precision dispense system with meniscus control
TOKYO ELECTRON LTD0 citations39
US10807117B2Oct 20, 2020
Dispense nozzle with a dynamic liquid plug
TOKYO ELECTRON LTD0 citations31
NASMAN RONALD
3 patentsUS8194384B2Jun 5, 2012
High temperature electrostatic chuck and method of using
NASMAN RONALD27 citations90
US8272347B2Sep 25, 2012
High temperature gas heating device for a vapor deposition system
NASMAN RONALD13 citations82
US8291856B2Oct 23, 2012
Gas heating device for a vapor deposition system
NASMAN RONALD9 citations78