Inventor
ROBISON RODNEY L
US12 patents
⚠️ This page may combine multiple inventors who share the name “ROBISON RODNEY L”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
10 patentsUS10403501B2Sep 3, 2019
High-purity dispense system
TOKYO ELECTRON LTD3 citations71
US12341053B2Jun 24, 2025
System for backside deposition of a substrate
TOKYO ELECTRON LTD0 citations62
US11908728B2Feb 20, 2024
System for backside deposition of a substrate
TOKYO ELECTRON LTD0 citations62
US7776748B2Aug 17, 2010
Selective-redeposition structures for calibrating a plasma process
TOKYO ELECTRON LTD3 citations62
US7591935B2Sep 22, 2009
Enhanced reliability deposition baffle for iPVD
TOKYO ELECTRON LTD2 citations62
US7901545B2Mar 8, 2011
Ionized physical vapor deposition (iPVD) process
TOKYO ELECTRON LTD6 citations58
US7772110B2Aug 10, 2010
Electrical contacts for integrated circuits and methods of forming using gas cluster ion beam processing
TOKYO ELECTRON LTD3 citations53
US10426001B2Sep 24, 2019
Processing system for electromagnetic wave treatment of a substrate at microwave frequencies
TOKYO ELECTRON LTD0 citations41
US7749398B2Jul 6, 2010
Selective-redeposition sources for calibrating a plasma process
TOKYO ELECTRON LTD0 citations41
US10354872B2Jul 16, 2019
High-precision dispense system with meniscus control
TOKYO ELECTRON LTD0 citations39