Inventor
OHKUBO RYO
JP29 patents
⚠️ This page may combine multiple inventors who share the name “OHKUBO RYO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HOYA CORP
28 patentsUS7011910B2Mar 14, 2006
Halftone-type phase-shift mask blank, and halftone-type phase-shift mask
HOYA CORP13 citations84
US7115341B2Oct 3, 2006
Halftone phase shift mask blank, halftone phase shift mask, and method of producing the same
HOYA CORP14 citations83
US7282305B2Oct 16, 2007
Reflective mask blank having a programmed defect and method of producing the same, reflective mask having a programmed defect and method of producing the same, and substrate for use in producing the reflective mask blank or the reflective mask having a programmed defect
HOYA CORP17 citations79
US11762279B2Sep 19, 2023
Mask blank, method for manufacturing reflective mask, and method for manufacturing semiconductor device
HOYA CORP3 citations73
US11435662B2Sep 6, 2022
Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device
HOYA CORP3 citations73
US11281089B2Mar 22, 2022
Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device
HOYA CORP4 citations73
US11119400B2Sep 14, 2021
Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device
HOYA CORP2 citations73
US10915016B2Feb 9, 2021
Mask blank, method for manufacturing phase shift mask, and method for manufacturing semiconductor device
HOYA CORP3 citations73
US10101650B2Oct 16, 2018
Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor device
HOYA CORP2 citations73
US9625805B2Apr 18, 2017
Reflective mask blank, reflective mask and method of manufacturing reflective mask
HOYA CORP2 citations73
US12153338B2Nov 26, 2024
Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device
HOYA CORP0 citations62
US12007684B2Jun 11, 2024
Mask blank, method of manufacturing imprint mold, method of manufacturing transfer mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device
HOYA CORP0 citations62
US11630388B2Apr 18, 2023
Mask blank, method for manufacturing phase shift mask, and method for manufacturing semiconductor device
HOYA CORP0 citations62
US10481485B2Nov 19, 2019
Mask blank, transfer mask, method of manufacturing transfer mask and method of manufacturing semiconductor device
HOYA CORP1 citations62
US9494852B2Nov 15, 2016
Mask blank and method of manufacturing phase shift mask
HOYA CORP2 citations62
US6317480B1Nov 13, 2001
Method of manufacturing X-ray mask and X-ray mask blank, and X-ray mask and X-ray mask blank manufactured thereby
HOYA CORP3 citations62
US11415875B2Aug 16, 2022
Mask blank, phase shift mask, and method for manufacturing semiconductor device
HOYA CORP0 citations59
US11022875B2Jun 1, 2021
Mask blank, phase shift mask, and method of manufacturing semiconductor device
HOYA CORP1 citations59
US11009787B2May 18, 2021
Mask blank, phase shift mask, and method for manufacturing semiconductor device
HOYA CORP0 citations59
US11054735B2Jul 6, 2021
Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device
HOYA CORP0 citations52
US10571797B2Feb 25, 2020
Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor device
HOYA CORP0 citations52
US10527931B2Jan 7, 2020
Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor device
HOYA CORP0 citations52
US9952497B2Apr 24, 2018
Mask blank and method of manufacturing phase shift mask
HOYA CORP0 citations52
US9726972B2Aug 8, 2017
Mask blank, transfer mask, and method for manufacturing transfer mask
HOYA CORP1 citations52
US9075315B2Jul 7, 2015
Reflective mask blank, reflective mask and method of manufacturing reflective mask
HOYA CORP0 citations52
US9029048B2May 12, 2015
Mask blank, transfer mask, method of manufacturing transfer mask and method of manufacturing semiconductor device
HOYA CORP0 citations52
US7632612B2Dec 15, 2009
Halftone phase shift mask blank, halftone phase shift mask, and method of producing the same
HOYA CORP1 citations51
US10365555B2Jul 30, 2019
Mask blank, transfer mask and methods of manufacturing the same
HOYA CORP0 citations42