P

Inventor

ZI AN-REN

TW67 patents

Patents

50 patents
US10073347B1Sep 11, 2018

Semiconductor method of protecting wafer from bevel contamination

TAIWAN SEMICONDUCTOR MFG CO LTD19 citations94
US11300878B2Apr 12, 2022

Photoresist developer and method of developing photoresist

TAIWAN SEMICONDUCTOR MFG CO LTD6 citations86
US11054742B2Jul 6, 2021

EUV metallic resist performance enhancement via additives

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US10866511B2Dec 15, 2020

Extreme ultraviolet photolithography method with developer composition

TAIWAN SEMICONDUCTOR MFG CO LTD10 citations84
US10381481B1Aug 13, 2019

Multi-layer photoresist

TAIWAN SEMICONDUCTOR MFG CO LTD8 citations84
US12253800B2Mar 18, 2025

EUV metallic resist performance enhancement via additives

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations75
US12249507B2Mar 11, 2025

Method of manufacturing a semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations75
US12222650B2Feb 11, 2025

Photoresist underlayer and method of manufacturing a semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations75
US11971657B2Apr 30, 2024

Photoresist developer and method of developing photoresist

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11822238B2Nov 21, 2023

Extreme ultraviolet photolithography method with developer composition

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11681221B2Jun 20, 2023

EUV photoresist with low-activation-energy ligands or high-developer-solubility ligands

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11681226B2Jun 20, 2023

Metal-compound-removing solvent and method in lithography

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11605538B2Mar 14, 2023

Protective composition and method of forming photoresist pattern

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11456170B2Sep 27, 2022

Cleaning solution and method of cleaning wafer

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11269256B2Mar 8, 2022

Underlayer material for photoresist

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11029602B2Jun 8, 2021

Photoresist composition and method of forming photoresist pattern

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US11016386B2May 25, 2021

Photoresist composition and method of forming photoresist pattern

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10866516B2Dec 15, 2020

Metal-compound-removing solvent and method in lithography

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10741410B2Aug 11, 2020

Material composition and methods thereof

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10698317B2Jun 30, 2020

Underlayer material for photoresist

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10622211B2Apr 14, 2020

Metal-compound-removing solvent and method in lithography

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US10503070B2Dec 10, 2019

Photosensitive material and method of lithography

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10274847B2Apr 30, 2019

Humidity control in EUV lithography

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US12550685B2Feb 10, 2026

Protective composition and method of forming photoresist pattern

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12532687B2Jan 20, 2026

Cleaning solution and method of cleaning wafer

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12500084B2Dec 16, 2025

Semiconductor manufacturing apparatus and method of manufacturing semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12469692B2Nov 11, 2025

Cleaning solution and method of cleaning wafer

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12436458B2Oct 7, 2025

Photoresist composition and method of forming photoresist pattern

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12360456B2Jul 15, 2025

EUV metallic resist performance enhancement via additives

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12210286B2Jan 28, 2025

Metal-compound-removing solvent and method in lithography

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12210283B2Jan 28, 2025

EUV photoresist with low-activation-energy ligands or high-developer-solubility ligands

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12181798B2Dec 31, 2024

Extreme ultraviolet photolithography method with developer composition

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12174540B2Dec 24, 2024

Method of manufacturing a semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12050404B2Jul 30, 2024

Photoresist with polar-acid-labile-group

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12009210B2Jun 11, 2024

Method of manufacturing a semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US11934101B2Mar 19, 2024

Photoresist composition and method of forming photoresist pattern

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US11822251B2Nov 21, 2023

Photoresist with polar-acid-labile-group

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US11762296B2Sep 19, 2023

Method and apparatus of patterning a semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US11626285B2Apr 11, 2023

Method of manufacturing a semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US11495460B2Nov 8, 2022

Method for forming semiconductor structure by patterning resist layer having inorganic material

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US11460776B2Oct 4, 2022

Method and apparatus of patterning a semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US11307504B2Apr 19, 2022

Humidity control in EUV lithography

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US11287740B2Mar 29, 2022

Photoresist composition and method of forming photoresist pattern

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations63
US11215924B2Jan 4, 2022

Photoresist, developer, and method of forming photoresist pattern

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations63
US11137685B2Oct 5, 2021

Semiconductor method of protecting wafer from bevel contamination

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US11036137B2Jun 15, 2021

Method for forming semiconductor structure

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations63
US10990013B2Apr 27, 2021

Method for forming semiconductor structure

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US10741391B2Aug 11, 2020

Method for forming semiconductor structure by patterning resist layer having inorganic material

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations63
US12487527B2Dec 2, 2025

Photoresist developer and method of developing photoresist

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12354874B2Jul 8, 2025

Method of manufacturing semiconductor devices and pattern formation method

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

Showing the top 50 of 67 patents by PatentIndex Score.