P

Inventor

JEZEWSKI CHRISTOPHER J

US53 patents
⚠️ This page may combine multiple inventors who share the name “JEZEWSKI CHRISTOPHER J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

INTEL CORP

35 patents
US9997457B2Jun 12, 2018

Cobalt based interconnects and methods of fabrication thereof

INTEL CORP12 citations92
US10937689B2Mar 2, 2021

Self-aligned hard masks with converted liners

INTEL CORP7 citations84
US9406615B2Aug 2, 2016

Techniques for forming interconnects in porous dielectric materials

INTEL CORP6 citations84
US9385082B2Jul 5, 2016

Method of forming high density, high shorting margin, and low capacitance interconnects by alternating recessed trenches

INTEL CORP7 citations84
US11522059B2Dec 6, 2022

Metallic sealants in transistor arrangements

INTEL CORP2 citations73
US11380617B2Jul 5, 2022

Method of forming high density, high shorting margin, and low capacitance interconnects by alternating recessed trenches

INTEL CORP2 citations73
US10068845B2Sep 4, 2018

Seam healing of metal interconnects

INTEL CORP3 citations73
US9911694B2Mar 6, 2018

Method of forming high density, high shorting margin, and low capacitance interconnects by alternating recessed trenches

INTEL CORP2 citations73
US9379010B2Jun 28, 2016

Methods for forming interconnect layers having tight pitch interconnect structures

INTEL CORP4 citations73
US9258114B2Feb 9, 2016

Quantum key distribution (QSD) scheme using photonic integrated circuit (PIC)

INTEL CORP3 citations73
US10700007B2Jun 30, 2020

Cobalt based interconnects and methods of fabrication thereof

INTEL CORP3 citations72
US9343411B2May 17, 2016

Techniques for enhancing fracture resistance of interconnects

INTEL CORP3 citations68
US11830768B2Nov 28, 2023

Integrated circuits with line breaks and line bridges within a single interconnect level

INTEL CORP0 citations63
US11557536B2Jan 17, 2023

Integrated circuits (IC's) with electro-migration (EM)—resistant segments in an interconnect level

INTEL CORP0 citations63
US11205586B2Dec 21, 2021

Integrated circuits with line breaks and line bridges within a single interconnect level

INTEL CORP1 citations63
US7981756B2Jul 19, 2011

Common plate capacitor array connections, and processes of making same

INTEL CORP5 citations63
US12532526B2Jan 20, 2026

Metallic sealants in transistor arrangements

INTEL CORP0 citations62
US12033896B2Jul 9, 2024

Isolation wall stressor structures to improve channel stress and their methods of fabrication

INTEL CORP0 citations62
US11869894B2Jan 9, 2024

Metallization structures for stacked device connectivity and their methods of fabrication

INTEL CORP0 citations62
US11430814B2Aug 30, 2022

Metallization structures for stacked device connectivity and their methods of fabrication

INTEL CORP0 citations62
US11393722B2Jul 19, 2022

Isolation wall stressor structures to improve channel stress and their methods of fabrication

INTEL CORP0 citations62
US11328993B2May 10, 2022

Cobalt based interconnects and methods of fabrication thereof

INTEL CORP0 citations62
US11094587B2Aug 17, 2021

Use of noble metals in the formation of conductive connectors

INTEL CORP0 citations62
US12170319B2Dec 17, 2024

Dual contact process with stacked metal layers

INTEL CORP0 citations61
US11626451B2Apr 11, 2023

Magnetic memory device with ruthenium diffusion barrier

INTEL CORP0 citations60
US11462684B2Oct 4, 2022

Retention improvement by high-k encapsulation of RRAM devices

INTEL CORP0 citations60
US11444205B2Sep 13, 2022

Contact stacks to reduce hydrogen in thin film transistor

INTEL CORP1 citations60
US11652067B2May 16, 2023

Methods of forming substrate interconnect structures for enhanced thin seed conduction

INTEL CORP0 citations54
US10629525B2Apr 21, 2020

Seam healing of metal interconnects

INTEL CORP0 citations52
US10008557B2Jun 26, 2018

Vertical meander inductor for small core voltage regulators

INTEL CORP0 citations52
US9887161B2Feb 6, 2018

Techniques for forming interconnects in porous dielectric materials

INTEL CORP0 citations52
US9385085B2Jul 5, 2016

Interconnects with fully clad lines

INTEL CORP1 citations52
US12328927B2Jun 10, 2025

Low resistance and reduced reactivity approaches for fabricating contacts and the resulting structures

INTEL CORP0 citations51
US12261114B2Mar 25, 2025

Metallization stacks with self-aligned staggered metal lines

INTEL CORP0 citations51
US9659869B2May 23, 2017

Forming barrier walls, capping, or alloys /compounds within metal lines

INTEL CORP1 citations49

JEZEWSKI CHRISTOPHER J

5 patents

TAHOE RES LTD

3 patents

PILLARISETTY RAVI

2 patents

GRAND HAVEN STAMPED PROD

1 patent

AKOLKAR ROHAN N

1 patent

STEIGERWALD JOSEPH M

1 patent

EATON INTELLIGENT POWER LTD

1 patent

KUHN KELIN J

1 patent

Showing the top 50 of 53 patents by PatentIndex Score.