Inventor
JEZEWSKI CHRISTOPHER J
US53 patents
⚠️ This page may combine multiple inventors who share the name “JEZEWSKI CHRISTOPHER J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INTEL CORP
35 patentsUS9997457B2Jun 12, 2018
Cobalt based interconnects and methods of fabrication thereof
INTEL CORP12 citations92
US10937689B2Mar 2, 2021
Self-aligned hard masks with converted liners
INTEL CORP7 citations84
US9406615B2Aug 2, 2016
Techniques for forming interconnects in porous dielectric materials
INTEL CORP6 citations84
US9385082B2Jul 5, 2016
Method of forming high density, high shorting margin, and low capacitance interconnects by alternating recessed trenches
INTEL CORP7 citations84
US11522059B2Dec 6, 2022
Metallic sealants in transistor arrangements
INTEL CORP2 citations73
US11380617B2Jul 5, 2022
Method of forming high density, high shorting margin, and low capacitance interconnects by alternating recessed trenches
INTEL CORP2 citations73
US10068845B2Sep 4, 2018
Seam healing of metal interconnects
INTEL CORP3 citations73
US9911694B2Mar 6, 2018
Method of forming high density, high shorting margin, and low capacitance interconnects by alternating recessed trenches
INTEL CORP2 citations73
US9379010B2Jun 28, 2016
Methods for forming interconnect layers having tight pitch interconnect structures
INTEL CORP4 citations73
US9258114B2Feb 9, 2016
Quantum key distribution (QSD) scheme using photonic integrated circuit (PIC)
INTEL CORP3 citations73
US10700007B2Jun 30, 2020
Cobalt based interconnects and methods of fabrication thereof
INTEL CORP3 citations72
US9343411B2May 17, 2016
Techniques for enhancing fracture resistance of interconnects
INTEL CORP3 citations68
US11830768B2Nov 28, 2023
Integrated circuits with line breaks and line bridges within a single interconnect level
INTEL CORP0 citations63
US11557536B2Jan 17, 2023
Integrated circuits (IC's) with electro-migration (EM)—resistant segments in an interconnect level
INTEL CORP0 citations63
US11205586B2Dec 21, 2021
Integrated circuits with line breaks and line bridges within a single interconnect level
INTEL CORP1 citations63
US7981756B2Jul 19, 2011
Common plate capacitor array connections, and processes of making same
INTEL CORP5 citations63
US12532526B2Jan 20, 2026
Metallic sealants in transistor arrangements
INTEL CORP0 citations62
US12033896B2Jul 9, 2024
Isolation wall stressor structures to improve channel stress and their methods of fabrication
INTEL CORP0 citations62
US11869894B2Jan 9, 2024
Metallization structures for stacked device connectivity and their methods of fabrication
INTEL CORP0 citations62
US11430814B2Aug 30, 2022
Metallization structures for stacked device connectivity and their methods of fabrication
INTEL CORP0 citations62
US11393722B2Jul 19, 2022
Isolation wall stressor structures to improve channel stress and their methods of fabrication
INTEL CORP0 citations62
US11328993B2May 10, 2022
Cobalt based interconnects and methods of fabrication thereof
INTEL CORP0 citations62
US11094587B2Aug 17, 2021
Use of noble metals in the formation of conductive connectors
INTEL CORP0 citations62
US12170319B2Dec 17, 2024
Dual contact process with stacked metal layers
INTEL CORP0 citations61
US11626451B2Apr 11, 2023
Magnetic memory device with ruthenium diffusion barrier
INTEL CORP0 citations60
US11462684B2Oct 4, 2022
Retention improvement by high-k encapsulation of RRAM devices
INTEL CORP0 citations60
US11444205B2Sep 13, 2022
Contact stacks to reduce hydrogen in thin film transistor
INTEL CORP1 citations60
US11652067B2May 16, 2023
Methods of forming substrate interconnect structures for enhanced thin seed conduction
INTEL CORP0 citations54
US10629525B2Apr 21, 2020
Seam healing of metal interconnects
INTEL CORP0 citations52
US10008557B2Jun 26, 2018
Vertical meander inductor for small core voltage regulators
INTEL CORP0 citations52
US9887161B2Feb 6, 2018
Techniques for forming interconnects in porous dielectric materials
INTEL CORP0 citations52
US9385085B2Jul 5, 2016
Interconnects with fully clad lines
INTEL CORP1 citations52
US12328927B2Jun 10, 2025
Low resistance and reduced reactivity approaches for fabricating contacts and the resulting structures
INTEL CORP0 citations51
US12261114B2Mar 25, 2025
Metallization stacks with self-aligned staggered metal lines
INTEL CORP0 citations51
US9659869B2May 23, 2017
Forming barrier walls, capping, or alloys /compounds within metal lines
INTEL CORP1 citations49
JEZEWSKI CHRISTOPHER J
5 patentsUS9054164B1Jun 9, 2015
Method of forming high density, high shorting margin, and low capacitance interconnects by alternating recessed trenches
JEZEWSKI CHRISTOPHER J41 citations97
US9514983B2Dec 6, 2016
Cobalt based interconnects and methods of fabrication thereof
JEZEWSKI CHRISTOPHER J32 citations93
US8803283B2Aug 12, 2014
Vertical meander inductor for small core voltage regulators
JEZEWSKI CHRISTOPHER J2 citations62
US9490313B2Nov 8, 2016
Vertical meander inductor for small core voltage regulators
JEZEWSKI CHRISTOPHER J0 citations51
US9129844B2Sep 8, 2015
Vertical meander inductor for small core voltage regulators
JEZEWSKI CHRISTOPHER J0 citations51
TAHOE RES LTD
3 patentsUS12354956B2Jul 8, 2025
Cobalt based interconnects and methods of fabrication thereof
TAHOE RES LTD0 citations62
US12322699B2Jun 3, 2025
Method of forming high density, high shorting margin, and low capacitance interconnects by alternating recessed trenches
TAHOE RES LTD0 citations62
US11862563B2Jan 2, 2024
Cobalt based interconnects and methods of fabrication thereof
TAHOE RES LTD0 citations62
PILLARISETTY RAVI
2 patentsGRAND HAVEN STAMPED PROD
1 patentAKOLKAR ROHAN N
1 patentSTEIGERWALD JOSEPH M
1 patentEATON INTELLIGENT POWER LTD
1 patentKUHN KELIN J
1 patentShowing the top 50 of 53 patents by PatentIndex Score.