Inventor

YONEMURA KOUJI

JP2 patents

Patents

2 patents

US6869742B2Mar 22, 2005

Positive photoresist composition

TOKYO OHKA KOGYO CO LTD5 citations56

US7364831B2Apr 29, 2008

Positive resist composition and resist pattern formation method

TOKYO OHKA KOGYO CO LTD1 citations46