Inventor
KATANO AKIRA
JP5 patents
Patents
5 patentsUS6762005B2Jul 13, 2004
Positive photoresist composition and method of patterning resist thin film for use in inclined implantation process
TOKYO OHKA KOGYO CO LTD5 citations61
US6756178B2Jun 29, 2004
Positive photoresist composition and method of patterning resist thin film for use in inclined implantation process
TOKYO OHKA KOGYO CO LTD3 citations61
US6730769B2May 4, 2004
Novolak resin, production process thereof and positive photoresist composition using the novolak resin
TOKYO OHKA KOGYO CO LTD3 citations58
US6869742B2Mar 22, 2005
Positive photoresist composition
TOKYO OHKA KOGYO CO LTD5 citations56
US7932221B2Apr 26, 2011
Solvent for cleaning
TOKYO OHKA KOGYO CO LTD1 citations51