Inventor
NIIKURA SATOSHI
JP15 patents
Patents
15 patentsUS7358028B2Apr 15, 2008
Chemically amplified positive photo resist composition and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD10 citations83
US6296992B1Oct 2, 2001
Positive photoresist composition and process for forming contact hole
TOKYO OHKA KOGYO CO LTD6 citations74
US6177226B1Jan 23, 2001
Positive photoresist composition and process for forming contact hole
TOKYO OHKA KOGYO CO LTD7 citations74
US5518860AMay 21, 1996
Positive-working quinonediazide photoresist composition containing hydroxyalkyl substituted pyridine compound
TOKYO OHKA KOGYO CO LTD13 citations74
US6492085B1Dec 10, 2002
Positive photoresist composition and process and synthesizing polyphenol compound
TOKYO OHKA KOGYO CO LTD10 citations73
US5738968AApr 14, 1998
Positive photoresist composition
TOKYO OHKA KOGYO CO LTD8 citations73
US5384228AJan 24, 1995
Alkali-developable positive-working photosensitive resin composition
TOKYO OHKA KOGYO CO LTD8 citations73
US5728504AMar 17, 1998
Positive photoresist compositions and multilayer resist materials using the same
TOKYO OHKA KOGYO CO LTD15 citations72
US5332647AJul 26, 1994
Positive-working quinone diazide composition containing N,N',N"-substituted isocyanurate compound and associated article
TOKYO OHKA KOGYO CO LTD9 citations72
US6207340B1Mar 27, 2001
Positive photoresist composition and process for forming contact hole
TOKYO OHKA KOGYO CO LTD4 citations63
US6106994AAug 22, 2000
Production process of polyphenol diesters, and positive photosensitive compositions
TOKYO OHKA KOGYO CO LTD2 citations63
US5702861ADec 30, 1997
Positive photoresist composition
TOKYO OHKA KOGYO CO LTD5 citations62
US6869742B2Mar 22, 2005
Positive photoresist composition
TOKYO OHKA KOGYO CO LTD5 citations56
US6964838B2Nov 15, 2005
Positive photoresist composition
TOKYO OHKA KOGYO CO LTD0 citations52
US6620978B2Sep 16, 2003
Positive photoresist composition and process for synthesizing polyphenol compound
TOKYO OHKA KOGYO CO LTD1 citations52