Inventor
DOI KOUSUKE
JP35 patents
⚠️ This page may combine multiple inventors who share the name “DOI KOUSUKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
31 patentsUS5601961AFeb 11, 1997
High-sensitivity positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD24 citations92
US6517993B2Feb 11, 2003
Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio
TOKYO OHKA KOGYO CO LTD25 citations90
US7358028B2Apr 15, 2008
Chemically amplified positive photo resist composition and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD10 citations83
US7060410B2Jun 13, 2006
Novolak resin solution, positive photoresist composition and preparation method thereof
TOKYO OHKA KOGYO CO LTD6 citations74
US6296992B1Oct 2, 2001
Positive photoresist composition and process for forming contact hole
TOKYO OHKA KOGYO CO LTD6 citations74
US6177226B1Jan 23, 2001
Positive photoresist composition and process for forming contact hole
TOKYO OHKA KOGYO CO LTD7 citations74
US6030741AFeb 29, 2000
Positive resist composition
TOKYO OHKA KOGYO CO LTD8 citations74
US6379859B2Apr 30, 2002
Positive photoresist composition and process for forming resist pattern using same
TOKYO OHKA KOGYO CO LTD12 citations73
US6120969ASep 19, 2000
Polyphenol compound, quinonediazide ester and positive photoresist composition
TOKYO OHKA KOGYO CO LTD14 citations73
US5738968AApr 14, 1998
Positive photoresist composition
TOKYO OHKA KOGYO CO LTD8 citations73
US5384228AJan 24, 1995
Alkali-developable positive-working photosensitive resin composition
TOKYO OHKA KOGYO CO LTD8 citations73
US6187500B1Feb 13, 2001
Positive photoresist compositions and multilayer resist materials using same
TOKYO OHKA KOGYO CO LTD13 citations72
US5853948ADec 29, 1998
Positive photoresist compositions and multilayer resist materials using the same
TOKYO OHKA KOGYO CO LTD15 citations72
US5501936AMar 26, 1996
Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound
TOKYO OHKA KOGYO CO LTD15 citations72
US5478692ADec 26, 1995
Positive-working naphthoquinone diazide sulfonic acid ester photoresist composition containing 4,4'-bis(dialkylamino)benzophenone
TOKYO OHKA KOGYO CO LTD13 citations72
US5434031AJul 18, 1995
Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive
TOKYO OHKA KOGYO CO LTD16 citations72
US6566031B1May 20, 2003
Positive photoresist composition, substrate with a photosensitive film and process for imaging a resist pattern
TOKYO OHKA KOGYO CO LTD3 citations63
US6406827B2Jun 18, 2002
Positive photoresist composition and process for forming resist pattern
TOKYO OHKA KOGYO CO LTD4 citations63
US6300033B1Oct 9, 2001
Positive photoresist composition and process for forming resist pattern
TOKYO OHKA KOGYO CO LTD6 citations63
US6207340B1Mar 27, 2001
Positive photoresist composition and process for forming contact hole
TOKYO OHKA KOGYO CO LTD4 citations63
US6312863B1Nov 6, 2001
Positive photoresist composition
TOKYO OHKA KOGYO CO LTD5 citations62
US6127087AOct 3, 2000
Positive photoresist compositions and multilayer resist materials using same
TOKYO OHKA KOGYO CO LTD5 citations62
US5702861ADec 30, 1997
Positive photoresist composition
TOKYO OHKA KOGYO CO LTD5 citations62
US5401605AMar 28, 1995
Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound
TOKYO OHKA KOGYO CO LTD5 citations62
US6762005B2Jul 13, 2004
Positive photoresist composition and method of patterning resist thin film for use in inclined implantation process
TOKYO OHKA KOGYO CO LTD5 citations61
US6756178B2Jun 29, 2004
Positive photoresist composition and method of patterning resist thin film for use in inclined implantation process
TOKYO OHKA KOGYO CO LTD3 citations61
US6475694B2Nov 5, 2002
Positive photoresist composition comprising a phenolic compound having both an acid-decomposable group and a naphthoquinonediazide sulfonyl group
TOKYO OHKA KOGYO CO LTD4 citations61
US6939926B2Sep 6, 2005
Phenol novolak resin, production process thereof, and positive photoresist composition using the same
TOKYO OHKA KOGYO CO LTD2 citations60
US6869742B2Mar 22, 2005
Positive photoresist composition
TOKYO OHKA KOGYO CO LTD5 citations56
US6964838B2Nov 15, 2005
Positive photoresist composition
TOKYO OHKA KOGYO CO LTD0 citations52
US6884566B2Apr 26, 2005
Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio
TOKYO OHKA KOGYO CO LTD0 citations50