Inventor
LOESCHNER HANS
AT24 patents
⚠️ This page may combine multiple inventors who share the name “LOESCHNER HANS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IMS IONEN MIKROFAB SYST
14 patentsUS6858118B2Feb 22, 2005
Apparatus for enhancing the lifetime of stencil masks
IMS IONEN MIKROFAB SYST52 citations92
US6326632B1Dec 4, 2001
Particle-optical imaging system for lithography purposes
IMS IONEN MIKROFAB SYST23 citations92
US4780382AOct 25, 1988
Process for making a transmission mask
IMS IONEN MIKROFAB SYST28 citations92
US6136160AOct 24, 2000
Process for producing a carbon film on a substrate
IMS IONEN MIKROFAB SYST72 citations91
US6909103B2Jun 21, 2005
Ion irradiation of a target at very high and very low kinetic ion energies
IMS IONEN MIKROFAB SYST12 citations84
US5876880AMar 2, 1999
Process for producing a structured mask
IMS IONEN MIKROFAB SYST19 citations83
US5672449ASep 30, 1997
Silicon membrane and method of making same
IMS IONEN MIKROFAB SYST19 citations82
US4859857AAug 22, 1989
Ion-projection apparatus and method of operating same
IMS IONEN MIKROFAB SYST16 citations74
US4835392AMay 30, 1989
Ion-projection apparatus
IMS IONEN MIKROFAB SYST9 citations74
US4823011AApr 18, 1989
Ion-projection lithographic apparatus with means for aligning the mask image with the substrate
IMS IONEN MIKROFAB SYST16 citations74
US4775797AOct 4, 1988
Method of stabilizing a mask
IMS IONEN MIKROFAB SYST10 citations74
US5874739AFeb 23, 1999
Arrangement for shadow-casting lithography
IMS IONEN MIKROFAB SYST9 citations73
US4891547AJan 2, 1990
Particle or radiation beam mask and process for making same
IMS IONEN MIKROFAB SYST3 citations63
US6156217ADec 5, 2000
Method for the purpose of producing a stencil mask
IMS IONEN MIKROFAB SYST6 citations60