Inventor
HWANG CHEOL SEONG
KR32 patents
⚠️ This page may combine multiple inventors who share the name “HWANG CHEOL SEONG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
14 patentsUS5618746AApr 8, 1997
Method for manufacturing a capacitor of semiconductor device having diffusion-blocking films
SAMSUNG ELECTRONICS CO LTD75 citations96
US5940705AAug 17, 1999
Methods of forming floating-gate FFRAM devices
SAMSUNG ELECTRONICS CO LTD55 citations95
US6177284B1Jan 23, 2001
Conductive diffusion barrier layer, semiconductor device having the same, and manufacturing thereof
SAMSUNG ELECTRONICS CO LTD30 citations92
US5696015ADec 9, 1997
Method of fabricating capacitor structures for inclusion within semiconductor devices
SAMSUNG ELECTRONICS CO LTD19 citations92
US5621606AApr 15, 1997
Capacitor utilizing high dielectric constant material
SAMSUNG ELECTRONICS CO LTD34 citations92
US6001660ADec 14, 1999
Methods of forming integrated circuit capacitors using metal reflow techniques
SAMSUNG ELECTRONICS CO LTD48 citations90
US6180970B1Jan 30, 2001
Microelectronic devices including ferroelectric capacitors with lower electrodes extending into contact holes
SAMSUNG ELECTRONICS CO LTD18 citations83
US5834804ANov 10, 1998
Ferroelectric structure including MgTiO3 passivation
SAMSUNG ELECTRONICS CO LTD9 citations74
US5568352AOct 22, 1996
Capacitor and manufacturing method thereof
SAMSUNG ELECTRONICS CO LTD18 citations74
US10825889B2Nov 3, 2020
Semiconductor device including capacitor and method of forming the same
SAMSUNG ELECTRONICS CO LTD3 citations73
US12230667B2Feb 18, 2025
Semiconductor device including capacitor and method of forming the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US11574677B2Feb 7, 2023
Nonvolatile memory device with vertical string including semiconductor and resistance change layers, and method of operating the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US11411069B2Aug 9, 2022
Semiconductor device including capacitor and method of forming the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US11087839B2Aug 10, 2021
Nonvolatile memory device with vertical string including semiconductor and resistance change layers, and method of operating the same
SAMSUNG ELECTRONICS CO LTD1 citations62
SEOUL NAT UNIV R&DB FOUNDATION
6 patentsUS10210921B1Feb 19, 2019
Non-volatile ferroelectric memory device and method of driving the same
SEOUL NAT UNIV R&DB FOUNDATION33 citations94
US10886276B2Jan 5, 2021
Semiconductor memory device and method of fabricating the same
SEOUL NAT UNIV R&DB FOUNDATION6 citations73
US12581661B2Mar 17, 2026
Crossbar array device applicable to graph data analysis, nueromorphic device including the same, operation method of crossbar array device and graph data analysis method using crossbar array device
SEOUL NAT UNIV R&DB FOUNDATION0 citations55
US12593436B2Mar 31, 2026
Vertically stacked memory device and manufacturing method thereof
SEOUL NAT UNIV R&DB FOUNDATION0 citations52
US12356873B2Jul 8, 2025
Method of forming chalcogenide-based thin film using atomic layer deposition process, method of forming phase change material layer and switching device, and method of fabricating memory device using the same
SEOUL NAT UNIV R&DB FOUNDATION0 citations52
US10622561B2Apr 14, 2020
Variable resistor, non-volatile memory device using the same, and method of fabricating thereof
SEOUL NAT UNIV R&DB FOUNDATION0 citations41
SAMSUNG ELECTRO MECH
3 patentsUS6980413B1Dec 27, 2005
Thin film multi-layered ceramic capacitor and method of manufacturing the same
SAMSUNG ELECTRO MECH21 citations92
US7564116B2Jul 21, 2009
Printed circuit board with embedded capacitors therein and manufacturing process thereof
SAMSUNG ELECTRO MECH33 citations91
US7378326B2May 27, 2008
Printed circuit board with embedded capacitors therein and manufacturing process thereof
SAMSUNG ELECTRO MECH9 citations83