Inventor
SUZUKI AKIYOSHI
JP119 patents
Patents
50 patentsUS5789734AAug 4, 1998
Exposure apparatus that compensates for spherical aberration of an image forming device
CANON KK103 citations98
US5463497AOct 31, 1995
Illumination device including an optical integrator defining a plurality of secondary light sources and related method
CANON KK166 citations98
US5305054AApr 19, 1994
Imaging method for manufacture of microdevices
CANON KK124 citations98
US5153773AOct 6, 1992
Illumination device including amplitude-division and beam movements
CANON KK214 citations98
US4814829AMar 21, 1989
Projection exposure apparatus
CANON KK162 citations98
US6128068AOct 3, 2000
Projection exposure apparatus including an illumination optical system that forms a secondary light source with a particular intensity distribution
CANON KK52 citations96
US6104472AAug 15, 2000
Projection exposure apparatus and device manufacturing method
CANON KK60 citations96
US5673102ASep 30, 1997
Image farming and microdevice manufacturing method and exposure apparatus in which a light source includes four quadrants of predetermined intensity
CANON KK74 citations96
US5359407AOct 25, 1994
Optical scanning apparatus, surface-state inspection apparatus and exposure apparatus
CANON KK61 citations96
US5331371AJul 19, 1994
Alignment and exposure method
CANON KK60 citations96
US5309197AMay 3, 1994
Projection exposure apparatus
CANON KK76 citations96
US5148214ASep 15, 1992
Alignment and exposure apparatus
CANON KK80 citations96
US5118957AJun 2, 1992
Method and apparatus for precisely detecting surface position of a patterned wafer
CANON KK77 citations96
US5117254AMay 26, 1992
Projection exposure apparatus
CANON KK61 citations96
US5017798AMay 21, 1991
Surface examining apparatus for detecting the presence of foreign particles on two or more surfaces
CANON KK57 citations96
US4886975ADec 12, 1989
Surface examining apparatus for detecting the presence of foreign particles on two or more surfaces
CANON KK44 citations96
US4883359ANov 28, 1989
Alignment method and pattern forming method using the same
CANON KK57 citations96
US4871257AOct 3, 1989
Optical apparatus for observing patterned article
CANON KK56 citations96
US4851882AJul 25, 1989
Illumination optical system
CANON KK74 citations96
US4688932AAug 25, 1987
Exposure apparatus
CANON KK59 citations96
US4653903AMar 31, 1987
Exposure apparatus
CANON KK76 citations96
US5140366AAug 18, 1992
Exposure apparatus with a function for controlling alignment by use of latent images
CANON KK59 citations95
US5105075AApr 14, 1992
Projection exposure apparatus
CANON KK121 citations95
US7217503B2May 15, 2007
Exposure method and apparatus
CANON KK41 citations93
US7107573B2Sep 12, 2006
Method for setting mask pattern and illumination condition
CANON KK48 citations93
US6344892B1Feb 5, 2002
Exposure apparatus and device manufacturing method using same
CANON KK34 citations93
US6172740B1Jan 9, 2001
Projection exposure apparatus and device manufacturing method
CANON KK23 citations93
US5631773AMay 20, 1997
Image projection method and semiconductor device manufacturing method using the same
CANON KK18 citations93
US5608575AMar 4, 1997
Image projection method and semiconductor device manufacturing method using the same
CANON KK29 citations93
US5574492ANov 12, 1996
Imaging method and semiconductor device manufacturing method using the same
CANON KK19 citations93
US5361122ANov 1, 1994
Autofocusing device and projection exposure apparatus with the same
CANON KK35 citations93
US5268744ADec 7, 1993
Method of positioning a wafer with respect to a focal plane of an optical system
CANON KK42 citations93
US5262822ANov 16, 1993
Exposure method and apparatus
CANON KK30 citations93
US5171965ADec 15, 1992
Exposure method and apparatus
CANON KK51 citations93
US5166754ANov 24, 1992
Alignment system
CANON KK44 citations93
US5160957ANov 3, 1992
Alignment and exposure apparatus
CANON KK52 citations93
US5133603AJul 28, 1992
Device for observing alignment marks on a mask and wafer
CANON KK48 citations93
US5048968ASep 17, 1991
Alignment mark detecting optical system
CANON KK39 citations93
US5048967ASep 17, 1991
Detection optical system for detecting a pattern on an object
CANON KK49 citations93
US4888614ADec 19, 1989
Observation system for a projection exposure apparatus
CANON KK24 citations93
US4875076AOct 17, 1989
Exposure apparatus
CANON KK27 citations93
US4831274AMay 16, 1989
Surface inspecting device for detecting the position of foreign matter on a substrate
CANON KK42 citations93
US4798450AJan 17, 1989
Imaging optical system
CANON KK24 citations93
US4795911AJan 3, 1989
Surface examining apparatus for detecting the presence of foreign particles on the surface
CANON KK54 citations93
US4780615AOct 25, 1988
Alignment system for use in pattern transfer apparatus
CANON KK35 citations93
US4645924AFeb 24, 1987
Observation apparatus with selective light diffusion
CANON KK48 citations93
US4634240AJan 6, 1987
Optical apparatus using polarized light
CANON KK49 citations93
US4395117AJul 26, 1983
Printing apparatus having an in-focus detector
CANON KK29 citations93
US7126667B2Oct 24, 2006
Exposure apparatus and method
CANON KK17 citations92
US6992750B2Jan 31, 2006
Exposure apparatus and method
CANON KK36 citations92
Showing the top 50 of 119 patents by PatentIndex Score.