Inventor
FUJIWARA SEISHI
JP23 patents
Patents
23 patentsUS5679125AOct 21, 1997
Method for producing silica glass for use with light in a vacuum ultraviolet wavelength range
NIKON CORP59 citations96
US6649268B1Nov 18, 2003
Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member
NIKON CORP25 citations92
US6291377B1Sep 18, 2001
Silica glass and its manufacturing method
NIKON CORP25 citations92
US6174830B1Jan 16, 2001
Silica glass having superior durability against excimer laser beams and method for manufacturing the same
NIKON CORP16 citations92
US6061174AMay 9, 2000
Image-focusing optical system for ultraviolet laser
NIKON CORP32 citations92
US5958809ASep 28, 1999
Fluorine-containing silica glass
NIKON CORP47 citations92
US5702495ADec 30, 1997
Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
NIKON CORP29 citations92
US5699183ADec 16, 1997
Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
NIKON CORP25 citations92
US5696624ADec 9, 1997
Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
NIKON CORP24 citations92
US6094940AAug 1, 2000
Manufacturing method of synthetic silica glass
NIKON CORP23 citations89
US6505484B1Jan 14, 2003
Forming method of silica glass and forming apparatus thereof
NIKON CORP16 citations84
US5703712ADec 30, 1997
Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
NIKON CORP11 citations82
US6587181B2Jul 1, 2003
Optical system with improved durability for projection exposure apparatus and method for manufacturing optical system for projection exposure apparatus
NIKON CORP8 citations74
US6587262B1Jul 1, 2003
UV synthetic silica glass optical member and reduction projection exposure apparatus using the same
NIKON CORP7 citations74
US6473226B1Oct 29, 2002
Silica glass member
NIKON CORP13 citations74
US6374639B2Apr 23, 2002
Silica glass and its manufacturing method
NIKON CORP10 citations74
US6373554B1Apr 16, 2002
Optical system with improved durability for projection exposure apparatus and method for manufacturing optical system for projection exposure apparatus
NIKON CORP5 citations74
US6075607AJun 13, 2000
Method for estimating durability of optical member against excimer laser irradiation and method for selecting silica glass optical member
NIKON CORP13 citations74
US6339033B2Jan 15, 2002
Silica glass having superior durability against excimer laser beams and method for manufacturing the same
NIKON CORP9 citations73
US6442973B1Sep 3, 2002
Synthetic silica glass and its manufacturing method
NIKON CORP6 citations62
US6835683B2Dec 28, 2004
Quartz glass member and projection aligner
NIKON CORP0 citations52
US6378340B2Apr 30, 2002
Manufacturing method of synthetic silica glass
NIKON CORP1 citations52
US9580331B2Feb 28, 2017
CaF2 polycrystalline body, focus ring, plasma processing apparatus, and method for producing CaF2 polycrystalline body
NIKON CORP0 citations42