Inventor

MOS EVERHARDUS CORNELIS

NL74 patents

⚠️ This page may combine multiple inventors who share the name “MOS EVERHARDUS CORNELIS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MOS EVERHARDUS CORNELIS

ASML NETHERLANDS BV

Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurement

Device inspection method and apparatus using an asymmetric marker

Alignment system for lithographic apparatus for measuring a position of an alignment mark

Lithographic apparatus and device manufacturing method

Method and apparatus for angular-resolved spectroscopic lithography characterization

Computational metrology

Method of determining a measurement subset of metrology points on a substrate, associated apparatus and computer program

Method and apparatus for angular-resolved spectroscopic lithography characterization

Method of measurement, an inspection apparatus and a lithographic apparatus

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method, substrate for use in the methods

Method and apparatus for angular-resolved spectroscopic lithography characterization

Lithographic apparatus and device manufacturing method

Computational metrology

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

Methods and apparatus for measuring a property of a substrate

Lithographic apparatus and device manufacturing method using overlay measurement

Methods and apparatus for measuring a property of a substrate

Method of selecting a grid model for correcting a process recipe for grid deformations in a lithographic apparatus and lithographic assembly using the same

Lithographic apparatus, device manufacturing method, and device manufactured thereby

Computer program for determining a corrected position of a measured alignment mark, device manufacturing method, and device manufactured thereby

Metrology target, method and apparatus, target design method, computer program and lithographic system

Methods and apparatus for measuring a property of a substrate

Methods and apparatus for calculating substrate model parameters and controlling lithographic processing

Method for optimization of a lithographic process

Methods and apparatus for measuring a property of a substrate

Computational metrology

Method and apparatus for inspection and metrology

Method for determining contribution to a fingerprint

Methods and apparatus for calculating substrate model parameters and controlling lithographic processing

Method and apparatus for inspection and metrology

Inspection apparatus, an apparatus for projecting an image and a method of measuring a property of a substrate

Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurement

Method of inspection, a method of manufacturing, an inspection apparatus, a substrate, a mask, a lithography apparatus and a lithographic cell

Alignment mark, use of a hard mask material, and method

Computational metrology

Method and apparatus to reduce effects of nonlinear behavior

Device manufacturing method and computer program product

Methods and apparatus for measuring a property of a substrate

Lithographic apparatus and device manufacturing method using overlay measurement quality indication

Computational metrology

MOS EVERHARDUS CORNELIS

Alignment system, lithographic system and method

Optimization method and a lithographic cell

Lithographic apparatus, device manufacturing method and device for correcting overlay errors between overlapping patterns

Process, apparatus, and device for determining intra-field correction to correct overlay errors between overlapping patterns

VAN DER SCHAAR MAURITS

Method of measurement, an inspection apparatus and a lithographic apparatus

Substrate used in a method and apparatus for angular-resolved spectroscopic lithography characterization

Inspection apparatus and method for measuring a property of a substrate

ASML NETHERLANDS N V

Alignment mark deformation estimating method, substrate position predicting method, alignment system and lithographic apparatus

DEN BOEF ARIE JEFFREY

Lithographic apparatus and device manufacturing method using overlay measurement

ASML NETHERLAND BV

Lithographic method