Inventor
TEN BERGE PETER
NL23 patents
Patents
23 patentsUS7927090B2Apr 19, 2011
Imprint lithographic apparatus, device manufacturing method and device manufactured thereby
ASML NETHERLANDS BV12 citations83
US10317191B2Jun 11, 2019
Methods and apparatus for measuring a property of a substrate
ASML NETHERLANDS BV4 citations82
US9594029B2Mar 14, 2017
Methods and apparatus for measuring a property of a substrate
ASML NETHERLANDS BV4 citations81
US10996176B2May 4, 2021
Methods and apparatus for measuring a property of a substrate
ASML NETHERLANDS BV2 citations71
US10996573B2May 4, 2021
Method and system for increasing accuracy of pattern positioning
ASML NETHERLANDS BV2 citations71
US10746668B2Aug 18, 2020
Methods and apparatus for measuring a property of a substrate
ASML NETHERLANDS BV2 citations71
US11768441B2Sep 26, 2023
Method for controlling a manufacturing process and associated apparatuses
ASML NETHERLANDS BV4 citations70
US11170072B2Nov 9, 2021
Method and apparatus for inspection and metrology
ASML NETHERLANDS BV2 citations70
US11036146B2Jun 15, 2021
Method and apparatus to reduce effects of nonlinear behavior
ASML NETHERLANDS BV0 citations62
US11977034B2May 7, 2024
Methods and apparatus for measuring a property of a substrate
ASML NETHERLANDS BV0 citations61
US12493248B2Dec 9, 2025
Method for optimizing a sampling scheme and associated apparatuses
ASML NETHERLANDS BV0 citations60
USRE49460EMar 14, 2023
Inspection method and apparatus and lithographic processing cell
ASML NETHERLANDS BV0 citations60
USRE49199ESep 6, 2022
Inspection method and apparatus and lithographic processing cell
ASML NETHERLANDS BV0 citations60
US8887107B2Nov 11, 2014
Inspection method and apparatus and lithographic processing cell
ASML NETHERLANDS BV2 citations60
US11714357B2Aug 1, 2023
Method to predict yield of a device manufacturing process
ASML NETHERLANDS BV0 citations59
US11086229B2Aug 10, 2021
Method to predict yield of a device manufacturing process
ASML NETHERLANDS BV1 citations59
US7253077B2Aug 7, 2007
Substrate, method of preparing a substrate, method of measurement, lithographic apparatus, device manufacturing method and device manufactured thereby, and machine-readable storage medium
ASML NETHERLANDS BV2 citations58
US10816907B2Oct 27, 2020
Method for determining an optimized set of measurement locations for measurement of a parameter of a lithographic process, metrology system and computer program products for implementing such methods
ASML NETHERLANDS BV1 citations57
US7349071B2Mar 25, 2008
Pre-aligning a substrate in a lithographic apparatus, device manufacturing method, and device manufactured by the manufacturing method
ASML NETHERLANDS BV4 citations57
US10719011B2Jul 21, 2020
Method and apparatus to correct for patterning process error
ASML NETHERLANDS BV0 citations51
US10915689B2Feb 9, 2021
Method and apparatus to correct for patterning process error
ASML NETHERLANDS BV0 citations49
US7342642B2Mar 11, 2008
Pre-aligning a substrate in a lithographic apparatus, device manufacturing method, and device manufactured by the manufacturing method
ASML NETHERLANDS BV0 citations45
US10691863B2Jun 23, 2020
Method and apparatus to correct for patterning process error
ASML NETHERLANDS BV0 citations41