Inventor
WANG HOUGONG
CN22 patents
⚠️ This page may combine multiple inventors who share the name “WANG HOUGONG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
10 patentsUS5879523AMar 9, 1999
Ceramic coated metallic insulator particularly useful in a plasma sputter reactor
APPLIED MATERIALS INC160 citations99
US6913680B1Jul 5, 2005
Method of application of electrical biasing to enhance metal deposition
APPLIED MATERIALS INC30 citations92
US6672864B2Jan 6, 2004
Method and apparatus for processing substrates in a system having high and low pressure areas
APPLIED MATERIALS INC36 citations92
US6610189B2Aug 26, 2003
Method and associated apparatus to mechanically enhance the deposition of a metal film within a feature
APPLIED MATERIALS INC35 citations92
US6077402AJun 20, 2000
Central coil design for ionized metal plasma deposition
APPLIED MATERIALS INC24 citations92
US6299689B1Oct 9, 2001
Reflow chamber and process
APPLIED MATERIALS INC23 citations91
US7884032B2Feb 8, 2011
Thin film deposition
APPLIED MATERIALS INC10 citations83
US7006888B2Feb 28, 2006
Semiconductor wafer preheating
APPLIED MATERIALS INC8 citations74
US6139698AOct 31, 2000
Method and apparatus for reducing the first wafer effect
APPLIED MATERIALS INC6 citations74
US6303994B1Oct 16, 2001
Method and apparatus for reducing the first wafer effect
APPLIED MATERIALS INC2 citations63
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD
7 patentsUS11699541B2Jul 11, 2023
Magnetic thin film laminated structure deposition method
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD2 citations71
US12424363B2Sep 23, 2025
Magnetic thin film laminated structure and micro-inductive device thereof
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD0 citations61
US11328940B2May 10, 2022
Degassing chamber and semiconductor processing apparatus
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD1 citations61
US11309208B2Apr 19, 2022
Electrostatic chuck and method for manufacturing protrusions thereof
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD0 citations48
US10886142B2Jan 5, 2021
Annealing method, process chamber and annealing apparatus
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD0 citations46
US10622145B2Apr 14, 2020
Magnetic thin film deposition chamber and thin film deposition apparatus
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD0 citations40
US10381202B2Aug 13, 2019
Magnetron and magnetron sputtering device
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD0 citations36