Inventor

LIU WEN DAR

TW34 patents

⚠️ This page may combine multiple inventors who share the name “LIU WEN DAR”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LIU WEN DAR

VERSUM MAT US LLC

Etching solution for selectively removing tantalum nitride over titanium nitride during manufacture of a semiconductor device

Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor device

Etching solution having silicon oxide corrosion inhibitor and method of using the same

Etching solution for selectively removing silicon over silicon-germanium alloy from a silicon-germanium/ silicon stack during manufacture of a semiconductor device

Co/Cu selective wet etchant

Hafnium oxide corrosion inhibitor

Etching solution for selectively removing silicon nitride during manufacture of a semiconductor device

Etching solution for selectively removing silicon-germanium alloy from a silicon-germanium/ germanium stack during manufacture of a semiconductor device

Stripping compositions having high WN/W etching selectivity

Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor device

Etching solution and method for selectively removing silicon nitride during manufacture of a semiconductor device

Etching solution for tungsten word line recess

Etching solution for tungsten and GST films

Etching solution for selectively removing silicon-germanium alloy from a silicon-germanium/silicon stack during manufacture of a semiconductor device

Etching compositions and methods for using same

Composition for TiN hard mask removal and etch residue cleaning

Compositions and methods for preventing collapse of high aspect ratio structures during drying

Stripper solutions and methods of using stripper solutions

Etching solution and method for aluminum nitride

TiN hard mask and etch residue removal

Cleaning formulations

Copper corrosion inhibition system

AIR PROD & CHEM

Titanium nitride hard mask and etch residue removal

Selectively removing titanium nitride hard mask and etch residue removal

TiN hard mask and etch residual removal

Composition for titanium nitride hard mask and etch residue removal

Water-rich stripping and cleaning formulation and method for using same

Cleaning formulations

Stripper for dry film removal

Photoresist cleaning composition used in photolithography and a method for treating substrate therewith

RITEK CORP

Dye for optical recording medium

Optical recording medium and method for making the same

WU AIPING

Cleaning formulations and method of using the cleaning formulations

RAO MADHUKAR BHASKARA

Water-rich stripping and cleaning formulation and method for using same