Inventor
BHOSLE VIKRAM M
US15 patents
⚠️ This page may combine multiple inventors who share the name “BHOSLE VIKRAM M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC
8 patentsUS10290466B2May 14, 2019
Boron implanting using a co-gas
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC1 citations72
US9865430B2Jan 9, 2018
Boron implanting using a co-gas
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC3 citations72
US9887067B2Feb 6, 2018
Boron implanting using a co-gas
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC2 citations71
US9524849B2Dec 20, 2016
Method of improving ion beam quality in an implant system
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC4 citations70
US10804075B2Oct 13, 2020
Method of improving ion beam quality in an implant system
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC0 citations51
US10446371B2Oct 15, 2019
Boron implanting using a co-gas
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC0 citations51
US9478679B2Oct 25, 2016
Dielectric coating of the edge of a solar cell
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC1 citations51
US9780250B2Oct 3, 2017
Self-aligned mask for ion implantation
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC0 citations39
APPLIED MATERIALS INC
6 patentsUS12351900B2Jul 8, 2025
Plasma based film modification for semiconductor devices
APPLIED MATERIALS INC0 citations62
US11615945B2Mar 28, 2023
Plasma processing apparatus and techniques
APPLIED MATERIALS INC0 citations59
US11120973B2Sep 14, 2021
Plasma processing apparatus and techniques
APPLIED MATERIALS INC0 citations59
US12575379B2Mar 10, 2026
Measurement of lateral dopant concentration and distribution in high aspect ratio trench structures
APPLIED MATERIALS INC0 citations50
US12165852B2Dec 10, 2024
Cover ring to mitigate carbon contamination in plasma doping chamber
APPLIED MATERIALS INC0 citations50
US11501972B2Nov 15, 2022
Sacrificial capping layer for passivation using plasma-based implant process
APPLIED MATERIALS INC0 citations50