P

Inventor

TOMITA HIROSHI

JP249 patents
⚠️ This page may combine multiple inventors who share the name “TOMITA HIROSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOSHIBA KK

21 patents
US6593841B1Jul 15, 2003

Planar magnetic element

TOSHIBA KK159 citations99
US6404317B1Jun 11, 2002

Planar magnetic element

TOSHIBA KK117 citations99
US5801521ASep 1, 1998

Planar magnetic element

TOSHIBA KK108 citations99
US5583474ADec 10, 1996

Planar magnetic element

TOSHIBA KK218 citations99
US6853520B2Feb 8, 2005

Magnetoresistance effect element

TOSHIBA KK67 citations98
US6431185B1Aug 13, 2002

Apparatus and method for cleaning a semiconductor substrate

TOSHIBA KK60 citations96
US6185472B1Feb 6, 2001

Semiconductor device manufacturing method, manufacturing apparatus, simulation method and simulator

TOSHIBA KK76 citations95
US7749909B2Jul 6, 2010

Method of treating a semiconductor substrate

TOSHIBA KK46 citations94
US6436723B1Aug 20, 2002

Etching method and etching apparatus method for manufacturing semiconductor device and semiconductor device

TOSHIBA KK34 citations93
US6207303B1Mar 27, 2001

Multilayered magnetic film having buffer layer inserted between resin layer and laminated magnetic film layer and thin film inductor using the same

TOSHIBA KK46 citations93
US5959329ASep 28, 1999

Insulating oxide film formed by high-temperature wet oxidation

TOSHIBA KK24 citations93
US5522946AJun 4, 1996

Amorphous magnetic thin film and plane magnetic element using same

TOSHIBA KK47 citations93
US7838425B2Nov 23, 2010

Method of treating surface of semiconductor substrate

TOSHIBA KK27 citations92
US7476414B2Jan 13, 2009

Magnetoresistance effect element

TOSHIBA KK14 citations92
US6492271B1Dec 10, 2002

Semiconductor device and method of manufacturing the same

TOSHIBA KK27 citations92
US6286524B1Sep 11, 2001

Wafer drying apparatus and method with residual particle removability enhancement

TOSHIBA KK46 citations92
US6054373AApr 25, 2000

Method of and apparatus for removing metallic impurities diffused in a semiconductor substrate

TOSHIBA KK24 citations92
US6001461ADec 14, 1999

Electronic parts and manufacturing method thereof

TOSHIBA KK44 citations92
US5757063AMay 26, 1998

Semiconductor device having an extrinsic gettering film

TOSHIBA KK47 citations92
US5709958AJan 20, 1998

Electronic parts

TOSHIBA KK48 citations92
US7985683B2Jul 26, 2011

Method of treating a semiconductor substrate

TOSHIBA KK13 citations91

HITACHI LTD

5 patents

TAKATA CORP

5 patents

TOKYO ELECTRON LTD

4 patents

KONICA MINOLTA SYSTEMS LAB INC

3 patents

EBARA CORP

3 patents

TEIJIN LTD

2 patents

AISIN AW CO

1 patent

OMRON TATEISI ELECTRONICS CO

1 patent

TOYOTA MOTOR CO LTD

1 patent

MINOLTA CO LTD

1 patent

GEO SEARCH CO LTD

1 patent

MINOLTA CAMERA KK

1 patent

SANSHIN KOGYO KK

1 patent

Showing the top 50 of 249 patents by PatentIndex Score.