Inventor
BUHR GERHARD
DE50 patents
⚠️ This page may combine multiple inventors who share the name “BUHR GERHARD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HOECHST AG
37 patentsUS4189323AFeb 19, 1980
Radiation-sensitive copying composition
HOECHST AG156 citations97
US4619998AOct 28, 1986
Light-sensitive triazines possessing trichloromethyl groups
HOECHST AG50 citations96
US4311782AJan 19, 1982
Radiation-sensitive mixture and process for the production of relief images
HOECHST AG59 citations96
US4248957AFeb 3, 1981
Acid degradable radiation-sensitive mixture
HOECHST AG68 citations95
US4247611AJan 27, 1981
Positive-working radiation-sensitive copying composition and method of using to form relief images
HOECHST AG105 citations95
US4696888ASep 29, 1987
Light-sensitive compounds possessing trichloromethyl groups, a process for their production and light-sensitive mixtures containing these compounds
HOECHST AG41 citations93
US4101323AJul 18, 1978
Radiation-sensitive copying composition
HOECHST AG87 citations93
US5397846AMar 14, 1995
Process for preparing organic compounds carrying tert-butyloxycarbonyl groups
HOECHST AG28 citations92
US4506003AMar 19, 1985
Positive-working radiation-sensitive mixture
HOECHST AG42 citations92
US4266001AMay 5, 1981
Light-sensitive mixture
HOECHST AG35 citations92
US5498506AMar 12, 1996
Positive-acting radiation-sensitive mixture and recording material produced therewith
HOECHST AG32 citations90
US4250247AFeb 10, 1981
Acid degradable radiation-sensitive mixture
HOECHST AG32 citations89
US3985566AOct 12, 1976
Photosensitive crosslinkable 1-carbonyloxy-1H-naphthalene-2-one polymers and process for their preparation
HOECHST AG19 citations82
US4927732AMay 22, 1990
Positive-working photosensitive composition containing a dye and positive-working photosensitive recording material prepared therefrom
HOECHST AG20 citations81
US4409314AOct 11, 1983
Light-sensitive compounds, light-sensitive mixture, and light-sensitive copying material prepared therefrom
HOECHST AG9 citations74
US5612169AMar 18, 1997
N,N-disubstituted sulfonamides and radiation-sensitive mixture prepared therewith
HOECHST AG13 citations73
US5529886AJun 25, 1996
Polymers having N,N-disubstituted sulfonamide pendent groups and use thereof
HOECHST AG12 citations73
US5442087AAug 15, 1995
Polymers having N,N-disubstituted sulfonamide pendent groups and use thereof
HOECHST AG10 citations73
US5292626AMar 8, 1994
Developer composition for irradiated, radiation-sensitive positive-working, negative-working and reversible reprographic layers
HOECHST AG13 citations73
US5114816AMay 19, 1992
Radiation-sensitive compounds, radiation-sensitive mixture prepared therewith and copying material
HOECHST AG9 citations73
US5008362AApr 16, 1991
Binders soluble in aqueous alkali and containing silanyl groups in the side chain, process for preparing same and also photosensitive mixture containing these compounds
HOECHST AG8 citations73
US4339530AJul 13, 1982
Developer mixture for developing exposed light-sensistive copying layers
HOECHST AG14 citations73
US5374184ADec 20, 1994
Photopolymerizable material and process for the production of a colored image
HOECHST AG10 citations71
US4421844ADec 20, 1983
Process for the preparation of relief copies
HOECHST AG16 citations67
US5413899AMay 9, 1995
Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfonic acid ester and recording material produced therewith wherein the 0-naphthoquinone diazides are partial esters
HOECHST AG2 citations63
US5162190ANov 10, 1992
1,2-naphthoquinone-2-diazide-sulfonic acid amides and photosensitive compositions containing these compounds
HOECHST AG5 citations63
US4774171ASep 27, 1988
Bis-1,2-naphthoquinone-2-diazide-sulfonic acid amides, their use in a radiation-sensitive mixture, and radiation-sensitive copying material
HOECHST AG5 citations63
US5563018AOct 8, 1996
(1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-sensitive mixture prepared therewith and radiation-sensitive recording material
HOECHST AG2 citations62
US5306595AApr 26, 1994
Composition containing naphthoquinone diazide sulfonic acid mixed esters and radiation-sensitive recording material prepared therewith
HOECHST AG3 citations62
US5206111AApr 27, 1993
Binders soluble in aqueous alkali and containing silanyl groups in the side chain for a photosensitive mixture
HOECHST AG2 citations62
US5066567ANov 19, 1991
Image reversal process utilizing a positive-working photosensitive composition containing a dye
HOECHST AG3 citations62
US5198325AMar 30, 1993
Photopolymerizable mixture, copying material containing same and process for producing highly heat-resistant relief structures wherein a trihalomethyl is the photoinitiator
HOECHST AG3 citations60
US5368975ANov 29, 1994
Positive-working 1,2-quinone diazide radiation-sensitive mixture and recording material containing urethane compound to diminish developer solubility
HOECHST AG5 citations59
US5192640AMar 9, 1993
Process for preparing 7-hydroxy-1,2-naphthoquinone-2-diazide-4-sulfonic acid or salts thereof
HOECHST AG1 citations52
US5077395ADec 31, 1991
Substituted 1,2-naphthoquinone-2-diazide-4-sulfonic acids and processes for their preparation and use
HOECHST AG1 citations52
US5268252ADec 7, 1993
Radiation-sensitive ester and process for its preparation
HOECHST AG0 citations51
US5529883AJun 25, 1996
Photosensitive material for the production of a colored image utilizing adhesion promoting layer
HOECHST AG1 citations49
AGFA GEVAERT AG
9 patentsUS5705317AJan 6, 1998
Radiation-sensitive mixture
AGFA GEVAERT AG11 citations73
US5654121AAug 5, 1997
Positive-working radiation-sensitive mixture
AGFA GEVAERT AG10 citations73
US5753405AMay 19, 1998
Positive-working recording material containing aluminum base and mat-finished quinone diazide layer developable in weak alkaline developers
AGFA GEVAERT AG3 citations63
US5693449ADec 2, 1997
Process for the production of a multicolored image and photosensitive material for carrying out this process
AGFA GEVAERT AG2 citations63
US5879852AMar 9, 1999
Positive-working radiation-sensitive mixture
AGFA GEVAERT AG4 citations62
US5776652AJul 7, 1998
Aromatic hexafluoropropanesulfonate diazonium salts and their use in radiation-sensitive mixtures
AGFA GEVAERT AG4 citations62
US5834157ANov 10, 1998
2-acylamino-9-arylacridines, process for their preparation and photosensitive mixtures containing them
AGFA GEVAERT AG3 citations56
US5725992AMar 10, 1998
Process for the production of a multicolored image and photosensitive material for carrying out this process
AGFA GEVAERT AG0 citations52
US5534373AJul 9, 1996
Peel-apart process for the production of a colored image and imaged product produced through the process
AGFA GEVAERT AG0 citations49