P

Inventor

BUHR GERHARD

DE50 patents
⚠️ This page may combine multiple inventors who share the name “BUHR GERHARD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HOECHST AG

37 patents
US4189323AFeb 19, 1980

Radiation-sensitive copying composition

HOECHST AG156 citations97
US4619998AOct 28, 1986

Light-sensitive triazines possessing trichloromethyl groups

HOECHST AG50 citations96
US4311782AJan 19, 1982

Radiation-sensitive mixture and process for the production of relief images

HOECHST AG59 citations96
US4248957AFeb 3, 1981

Acid degradable radiation-sensitive mixture

HOECHST AG68 citations95
US4247611AJan 27, 1981

Positive-working radiation-sensitive copying composition and method of using to form relief images

HOECHST AG105 citations95
US4696888ASep 29, 1987

Light-sensitive compounds possessing trichloromethyl groups, a process for their production and light-sensitive mixtures containing these compounds

HOECHST AG41 citations93
US4101323AJul 18, 1978

Radiation-sensitive copying composition

HOECHST AG87 citations93
US5397846AMar 14, 1995

Process for preparing organic compounds carrying tert-butyloxycarbonyl groups

HOECHST AG28 citations92
US4506003AMar 19, 1985

Positive-working radiation-sensitive mixture

HOECHST AG42 citations92
US4266001AMay 5, 1981

Light-sensitive mixture

HOECHST AG35 citations92
US5498506AMar 12, 1996

Positive-acting radiation-sensitive mixture and recording material produced therewith

HOECHST AG32 citations90
US4250247AFeb 10, 1981

Acid degradable radiation-sensitive mixture

HOECHST AG32 citations89
US3985566AOct 12, 1976

Photosensitive crosslinkable 1-carbonyloxy-1H-naphthalene-2-one polymers and process for their preparation

HOECHST AG19 citations82
US4927732AMay 22, 1990

Positive-working photosensitive composition containing a dye and positive-working photosensitive recording material prepared therefrom

HOECHST AG20 citations81
US4409314AOct 11, 1983

Light-sensitive compounds, light-sensitive mixture, and light-sensitive copying material prepared therefrom

HOECHST AG9 citations74
US5612169AMar 18, 1997

N,N-disubstituted sulfonamides and radiation-sensitive mixture prepared therewith

HOECHST AG13 citations73
US5529886AJun 25, 1996

Polymers having N,N-disubstituted sulfonamide pendent groups and use thereof

HOECHST AG12 citations73
US5442087AAug 15, 1995

Polymers having N,N-disubstituted sulfonamide pendent groups and use thereof

HOECHST AG10 citations73
US5292626AMar 8, 1994

Developer composition for irradiated, radiation-sensitive positive-working, negative-working and reversible reprographic layers

HOECHST AG13 citations73
US5114816AMay 19, 1992

Radiation-sensitive compounds, radiation-sensitive mixture prepared therewith and copying material

HOECHST AG9 citations73
US5008362AApr 16, 1991

Binders soluble in aqueous alkali and containing silanyl groups in the side chain, process for preparing same and also photosensitive mixture containing these compounds

HOECHST AG8 citations73
US4339530AJul 13, 1982

Developer mixture for developing exposed light-sensistive copying layers

HOECHST AG14 citations73
US5374184ADec 20, 1994

Photopolymerizable material and process for the production of a colored image

HOECHST AG10 citations71
US4421844ADec 20, 1983

Process for the preparation of relief copies

HOECHST AG16 citations67
US5413899AMay 9, 1995

Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfonic acid ester and recording material produced therewith wherein the 0-naphthoquinone diazides are partial esters

HOECHST AG2 citations63
US5162190ANov 10, 1992

1,2-naphthoquinone-2-diazide-sulfonic acid amides and photosensitive compositions containing these compounds

HOECHST AG5 citations63
US4774171ASep 27, 1988

Bis-1,2-naphthoquinone-2-diazide-sulfonic acid amides, their use in a radiation-sensitive mixture, and radiation-sensitive copying material

HOECHST AG5 citations63
US5563018AOct 8, 1996

(1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-sensitive mixture prepared therewith and radiation-sensitive recording material

HOECHST AG2 citations62
US5306595AApr 26, 1994

Composition containing naphthoquinone diazide sulfonic acid mixed esters and radiation-sensitive recording material prepared therewith

HOECHST AG3 citations62
US5206111AApr 27, 1993

Binders soluble in aqueous alkali and containing silanyl groups in the side chain for a photosensitive mixture

HOECHST AG2 citations62
US5066567ANov 19, 1991

Image reversal process utilizing a positive-working photosensitive composition containing a dye

HOECHST AG3 citations62
US5198325AMar 30, 1993

Photopolymerizable mixture, copying material containing same and process for producing highly heat-resistant relief structures wherein a trihalomethyl is the photoinitiator

HOECHST AG3 citations60
US5368975ANov 29, 1994

Positive-working 1,2-quinone diazide radiation-sensitive mixture and recording material containing urethane compound to diminish developer solubility

HOECHST AG5 citations59
US5192640AMar 9, 1993

Process for preparing 7-hydroxy-1,2-naphthoquinone-2-diazide-4-sulfonic acid or salts thereof

HOECHST AG1 citations52
US5077395ADec 31, 1991

Substituted 1,2-naphthoquinone-2-diazide-4-sulfonic acids and processes for their preparation and use

HOECHST AG1 citations52
US5268252ADec 7, 1993

Radiation-sensitive ester and process for its preparation

HOECHST AG0 citations51
US5529883AJun 25, 1996

Photosensitive material for the production of a colored image utilizing adhesion promoting layer

HOECHST AG1 citations49

AGFA GEVAERT AG

9 patents

PEINIGER ERNST GMBH

3 patents

CLARIANT GMBH

1 patent