Inventor
GAT ARNON
US21 patents
⚠️ This page may combine multiple inventors who share the name “GAT ARNON”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MATTSON TECH INC
9 patentsUS6727474B2Apr 27, 2004
Rapid thermal processing chamber for processing multiple wafers
MATTSON TECH INC58 citations96
US6610967B2Aug 26, 2003
Rapid thermal processing chamber for processing multiple wafers
MATTSON TECH INC51 citations96
US6403923B1Jun 11, 2002
System for controlling the temperature of a reflective substrate during rapid heating
MATTSON TECH INC66 citations96
US6717158B1Apr 6, 2004
Heating device for heating semiconductor wafers in thermal processing chambers
MATTSON TECH INC74 citations95
US6771895B2Aug 3, 2004
Heating device for heating semiconductor wafers in thermal processing chambers
MATTSON TECH INC35 citations94
US7226488B2Jun 5, 2007
Fast heating and cooling apparatus for semiconductor wafers
MATTSON TECH INC21 citations92
US7608802B2Oct 27, 2009
Heating device for heating semiconductor wafers in thermal processing chambers
MATTSON TECH INC12 citations91
US7038174B2May 2, 2006
Heating device for heating semiconductor wafers in thermal processing chambers
MATTSON TECH INC19 citations91
US6919271B2Jul 19, 2005
Method for rapidly heating and cooling semiconductor wafers
MATTSON TECH INC13 citations84
ASSOCIATES AG
3 patentsUS5970214AOct 19, 1999
Heating device for semiconductor wafers
ASSOCIATES AG75 citations96
US5960158ASep 28, 1999
Apparatus and method for filtering light in a thermal processing chamber
ASSOCIATES AG117 citations95
US5874711AFeb 23, 1999
Apparatus and method for determining the temperature of a radiating surface
ASSOCIATES AG87 citations91
GAT ARNON
3 patentsUS4356384AOct 26, 1982
Method and means for heat treating semiconductor material using high intensity CW lamps
GAT ARNON56 citations95
US4331485AMay 25, 1982
Method for heat treating semiconductor material using high intensity CW lamps
GAT ARNON85 citations95
US8138451B2Mar 20, 2012
Heating device for heating semiconductor wafers in thermal processing chambers
GAT ARNON15 citations90