P

Inventor

NOJIRI KAZUO

JP37 patents
⚠️ This page may combine multiple inventors who share the name “NOJIRI KAZUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI LTD

28 patents
US6607988B2Aug 19, 2003

Manufacturing method of semiconductor integrated circuit device

HITACHI LTD53 citations96
US6451665B1Sep 17, 2002

Method of manufacturing a semiconductor integrated circuit

HITACHI LTD66 citations96
US6340632B1Jan 22, 2002

Method of manufacturing a semiconductor device

HITACHI LTD44 citations96
US6326218B1Dec 4, 2001

Semiconductor integrated circuit and its manufacturing method

HITACHI LTD46 citations96
US5868854AFeb 9, 1999

Method and apparatus for processing samples

HITACHI LTD67 citations96
US5007981AApr 16, 1991

Method of removing residual corrosive compounds by plasma etching followed by washing

HITACHI LTD106 citations96
US5734188AMar 31, 1998

Semiconductor integrated circuit, method of fabricating the same and apparatus for fabricating the same

HITACHI LTD73 citations95
US5646489AJul 8, 1997

Plasma generator with mode restricting means

HITACHI LTD43 citations93
US5433789AJul 18, 1995

Methods and apparatus for generating plasma, and semiconductor processing methods using mode restricted microwaves

HITACHI LTD22 citations93
US6555464B2Apr 29, 2003

Semiconductor device and method of manufacturing the same

HITACHI LTD25 citations92
US6537415B2Mar 25, 2003

Apparatus for processing samples

HITACHI LTD17 citations92
US6432835B1Aug 13, 2002

Process for fabricating an integrated circuit device having a capacitor with an electrode formed at a high aspect ratio

HITACHI LTD25 citations92
US5917211AJun 29, 1999

Semiconductor integrated circuit, method of fabricating the same and apparatus for fabricating the same

HITACHI LTD37 citations92
US5264712ANov 23, 1993

Semiconductor integrated circuit, method of fabricating the same and apparatus for fabricating the same

HITACHI LTD27 citations92
US5200017AApr 6, 1993

Sample processing method and apparatus

HITACHI LTD38 citations92
US6186153B1Feb 13, 2001

Plasma treatment method and manufacturing method of semiconductor device

HITACHI LTD25 citations91
US5661061AAug 26, 1997

Process for fabricating a semiconductor integrated circuit device having the multi-layered fin structure

HITACHI LTD48 citations91
US6528400B2Mar 4, 2003

Method of manufacturing a semiconductor device

HITACHI LTD8 citations74
US5952245ASep 14, 1999

Method for processing samples

HITACHI LTD7 citations74
US6537417B2Mar 25, 2003

Apparatus for processing samples

HITACHI LTD6 citations73
US6254721B1Jul 3, 2001

Method and apparatus for processing samples

HITACHI LTD6 citations73
US6191045B1Feb 20, 2001

Method of treating surface of sample

HITACHI LTD10 citations73
US6036816AMar 14, 2000

Apparatus for processing a sample having a metal laminate

HITACHI LTD8 citations73
US6077788AJun 20, 2000

Method and apparatus for processing samples

HITACHI LTD5 citations63
US6989228B2Jan 24, 2006

Method and apparatus for processing samples

HITACHI LTD3 citations62
US6656846B2Dec 2, 2003

Apparatus for processing samples

HITACHI LTD2 citations62
US6656752B1Dec 2, 2003

Ion current density measuring method and instrument, and semiconductor device manufacturing method

HITACHI LTD5 citations62
US7132293B2Nov 7, 2006

Method and apparatus for processing samples

HITACHI LTD1 citations52

LAM RES CORP

3 patents

RENESAS TECH CORP

3 patents

MATSUSHITA GRAPHIC COMMUNIC

3 patents