Inventor

LENZ ERIC H

US48 patents

⚠️ This page may combine multiple inventors who share the name “LENZ ERIC H”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LENZ ERIC H

LAM RES CORP

Perimeter wafer lifting

Gas distribution system having fast gas switching capabilities

Perimeter wafer lifting

Cam-based arrangement for positioning confinement rings in a plasma processing chamber

Focus ring arrangement for substantially eliminating unconfined plasma in a plasma processing chamber

Composite electrode for plasma processes

Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor

Apparatus for reducing polymer deposition on a substrate and substrate support

Chamber configuration for confining a plasma

Chamber configuration for confining a plasma

Plasma confinement by use of preferred RF return path

Plasma confinement by use of preferred RF return path

Lower electrode design for higher uniformity

Power segmented electrode

Power segmented electrode

Thermal control of semiconductor wafer during reactive ion etching

Topology induced plasma enhancement for etched uniformity improvement

Methods for etching dielectric materials

Method and an apparatus for offsetting plasma bias voltage in bi-polar electro-static chucks

Linear drive system for use in a plasma processing system

Linear drive system for use in a plasma processing system

Electrode clamping assembly and method for assembly and use thereof

Shadow clamp

Lower electrode design for higher uniformity

Magnetic enhancement for mechanical confinement of plasma

Fast gas switching plasma processing apparatus

Apparatus for reducing polymer deposition on a substrate and substrate support

Techniques for reducing arcing-related damage in a clamping ring of a plasma processing system

Vapor delivery method and apparatus for solid and liquid precursors

Systems and methods for measuring entrained vapor

Methods for verifying gas flow rates from a gas supply system into a plasma processing chamber

Magnetic enhancement for mechanical confinement of plasma

Backside reactive inhibition gas

Composite electrode for plasma processes

Metal deposition

Sealing techniques suitable for different geometries and constrained spaces

Airflow management for low particulate count in a process tool

Edge exclusion control

Removable showerhead faceplate for semiconductor processing tools

Wafer support pedestal with wafer anti-slip and anti-rotation features

LENZ ERIC H

Substrate load and unload mechanisms for high throughput

Reduction of particle contamination produced by moving mechanisms in a process tool

Plasma confinement by use of preferred RF return path

Airflow management for low particulate count in a process tool

High throughput cleaner chamber

DHINDSA RAJINDER

Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor

HUANG ZHISONG

Gas distribution system having fast gas switching capabilities

TONG JOSE

Techniques for reducing arcing-related damage in a clamping ring of a plasma processing system