Inventor
HASUNUMA MASAHIKO
JP51 patents
⚠️ This page may combine multiple inventors who share the name “HASUNUMA MASAHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
44 patentsUS6071810AJun 6, 2000
Method of filling contact holes and wiring grooves of a semiconductor device
TOSHIBA KK101 citations99
US7420320B2Sep 2, 2008
Piezoelectric thin film device and method for manufacturing the same
TOSHIBA KK41 citations96
US6727593B2Apr 27, 2004
Semiconductor device with improved bonding
TOSHIBA KK48 citations96
US6673704B2Jan 6, 2004
Semiconductor device and method of manufacturing the same
TOSHIBA KK42 citations96
US6306756B1Oct 23, 2001
Method for production of semiconductor device
TOSHIBA KK62 citations96
US6090701AJul 18, 2000
Method for production of semiconductor device
TOSHIBA KK74 citations96
US4754950AJul 5, 1988
Valve
TOSHIBA KK65 citations94
US7921401B2Apr 5, 2011
Stress analysis method, wiring structure design method, program, and semiconductor device production method
TOSHIBA KK35 citations93
US7180192B2Feb 20, 2007
Semiconductor device
TOSHIBA KK17 citations93
US7112883B2Sep 26, 2006
Semiconductor device with temperature control mechanism
TOSHIBA KK24 citations93
US6958542B2Oct 25, 2005
Semiconductor device
TOSHIBA KK29 citations93
US7339256B2Mar 4, 2008
Semiconductor device
TOSHIBA KK47 citations92
US7323805B2Jan 29, 2008
Piezoelectric thin film device and method for manufacturing the same
TOSHIBA KK32 citations92
US6975033B2Dec 13, 2005
Semiconductor device and method for manufacturing the same
TOSHIBA KK19 citations92
US6746969B2Jun 8, 2004
Method of manufacturing semiconductor device
TOSHIBA KK27 citations92
US6552434B2Apr 22, 2003
Semiconductor device and manufacturing method thereof
TOSHIBA KK18 citations92
US6403462B1Jun 11, 2002
Method for manufacturing high reliability interconnection having diffusion barrier layer
TOSHIBA KK16 citations92
US6054770AApr 25, 2000
Electric solid state device and method for manufacturing the device
TOSHIBA KK35 citations92
US6001461ADec 14, 1999
Electronic parts and manufacturing method thereof
TOSHIBA KK44 citations92
US5709958AJan 20, 1998
Electronic parts
TOSHIBA KK48 citations92
US5187561AFeb 16, 1993
Metal single crystal line having a particular crystal orientation
TOSHIBA KK21 citations92
US7635646B2Dec 22, 2009
Method for fabricating semiconductor device
TOSHIBA KK12 citations84
US7301240B2Nov 27, 2007
Semiconductor device
TOSHIBA KK12 citations84
US6069071AMay 30, 2000
Method of manufacturing an interconnect by dissolving an intermetallic compound film into a main component of a metal film
TOSHIBA KK17 citations84
US7770274B2Aug 10, 2010
Piezoelectric thin film device and method for manufacturing the same
TOSHIBA KK5 citations74
US7579696B2Aug 25, 2009
Semiconductor device
TOSHIBA KK7 citations74
US6946387B2Sep 20, 2005
Semiconductor device and method for manufacturing the same
TOSHIBA KK11 citations74
US6440843B1Aug 27, 2002
Semiconductor device and method for manufacturing the same
TOSHIBA KK5 citations74
US6414394B1Jul 2, 2002
Semiconductor device
TOSHIBA KK6 citations74
US6110647AAug 29, 2000
Method of manufacturing semiconductor device
TOSHIBA KK9 citations74
US7994054B2Aug 9, 2011
Semiconductor device having oxidized metal film and manufacture method of the same
TOSHIBA KK6 citations73
US7791202B2Sep 7, 2010
Semiconductor device having oxidized metal film and manufacture method of the same
TOSHIBA KK4 citations73
US5498909AMar 12, 1996
Semiconductor device and method of manufacturing such semiconductor device
TOSHIBA KK11 citations73
US7067922B2Jun 27, 2006
Semiconductor device
TOSHIBA KK7 citations72
US7314827B2Jan 1, 2008
Method of manufacturing semiconductor device
TOSHIBA KK2 citations63
US7285859B2Oct 23, 2007
Semiconductor device
TOSHIBA KK5 citations63
US7119442B2Oct 10, 2006
Semiconductor device
TOSHIBA KK4 citations63
US7097946B2Aug 29, 2006
Photomask, method of manufacturing a photomask, and method of manufacturing an electronic product
TOSHIBA KK4 citations63
US6580171B2Jun 17, 2003
Semiconductor wiring device
TOSHIBA KK3 citations63
US6436849B1Aug 20, 2002
Method for manufacturing semiconductor device having low dielectric constant insulating film, wafer processing equipment and wafer storing box used in this method
TOSHIBA KK5 citations63
US7675183B2Mar 9, 2010
Semiconductor device including an insulating film and insulating pillars and manufacturing method of the semiconductor device
TOSHIBA KK4 citations62
US7095124B2Aug 22, 2006
Semiconductor device
TOSHIBA KK4 citations61
US7872353B2Jan 18, 2011
Semiconductor device
TOSHIBA KK2 citations52
US7601638B2Oct 13, 2009
Interconnect metallization method having thermally treated copper plate film with reduced micro-voids
TOSHIBA KK0 citations52
SANYO ELECTRIC CO
1 patentKABUSHIKI KAIHSA TOSHIBA
1 patentISHIZAKI TAKESHI
1 patentTOSHIBA MEMORY CORP
1 patentWADA JUNICHI
1 patentSAKATA ATSUKO
1 patentShowing the top 50 of 51 patents by PatentIndex Score.