Inventor
FUKUDA RITSUKO
JP4 patents
Patents
4 patentsUS6630285B2Oct 7, 2003
Positive sensitive resin composition and a process for forming a resist pattern therewith
MITSUI CHEMICALS INC2 citations60
US6433118B1Aug 13, 2002
Copolymer, a manufacturing process therefor and a solution containing thereof
MITSUI CHEMICALS INC2 citations60
US6281318B1Aug 28, 2001
Poly{1-(1-alkoxyalkoxy)-4-(1-methylethenyl)benzene} having narrow molecular weight distribution, its preparation process, and preparation process of poly{4-methylethenyl)phenol} having narrow molecular weight distribution
MITSUI CHEMICALS INC6 citations60
US6946234B2Sep 20, 2005
Positive sensitive resin composition and a process for forming a resist pattern therewith
MITSUI CHEMICALS INC0 citations50