Inventor
BUKOFSKY SCOTT J
US12 patents
⚠️ This page may combine multiple inventors who share the name “BUKOFSKY SCOTT J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
11 patentsUS6993741B2Jan 31, 2006
Generating mask patterns for alternating phase-shift mask lithography
IBM313 citations98
US6777147B1Aug 17, 2004
Method for evaluating the effects of multiple exposure processes in lithography
IBM86 citations97
US6451508B1Sep 17, 2002
Plural interleaved exposure process for increased feature aspect ratio in dense arrays
IBM24 citations92
US6451490B1Sep 17, 2002
Method to overcome image shortening by use of sub-resolution reticle features
IBM35 citations90
US6511791B1Jan 28, 2003
Multiple exposure process for formation of dense rectangular arrays
IBM19 citations84
US7239371B2Jul 3, 2007
Density-aware dynamic leveling in scanning exposure systems
IBM12 citations83
US7229936B2Jun 12, 2007
Method to reduce photoresist pattern collapse by controlled surface microroughening
IBM8 citations73
US6327023B1Dec 4, 2001
Optimization of reticle rotation for critical dimension and overlay improvement
IBM14 citations73
US7475380B2Jan 6, 2009
Generating mask patterns for alternating phase-shift mask lithography
IBM2 citations62
US7354779B2Apr 8, 2008
Topography compensated film application methods
IBM4 citations62
US6824932B2Nov 30, 2004
Self-aligned alternating phase shift mask patterning process
IBM4 citations62