Inventor

IMADA TOMOYUKI

JP28 patents

⚠️ This page may combine multiple inventors who share the name “IMADA TOMOYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IMADA TOMOYUKI

DAINIPPON INK & CHEMICALS

Epoxy resin composition, cured article thereof, novel epoxy resin, novel phenol compound, and process for preparing the same

Resin containing phenolic hydroxyl groups, and resist film

Modified hydroxy naphthalene novolak resin, production method for modified hydroxy naphthalene novolak resin, photosensitive composition, resist material and coating

Naphthol-type calixarene compound and method for producing the same, photosensitive composition, resist material, and coating

Compound containing modified phenolic hydroxy group, method for producing compound containing modified phenolic hydroxy group, photosensitive composition, resist material, and resist coating film

Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resin

Compound containing phenolic hydroxy group, photosensitive composition, composition for resists, resist coating film, curable composition, composition for resist underlayer films, and resist underlayer film

Curable composition for permanent resist films, and permanent resist film

Phenolic resin formed from a difunctional phenol and a divinyl ether

Phenolic hydroxyl-containing compound, composition containing the same, and cured film of the composition

Resist material

Novolak resins and resist materials

Calixarene compound and curable composition

Novolac phenol resin, manufacturing method therefor, photosensitive composition, resist material and coating film

Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resin

Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resin

Calixarene compound, curable composition, and cured product

Radically curable compound, method for producing radically curable compound, radically curable composition, cured product of the same, and resist-material composition

Phenolic hydroxyl group-containing compound, phenolic hydroxyl group-containing composition, (meth)acryloyl group-containing resin, curable composition, cured product thereof, and resist material

Radically curable compound, method for producing radically curable compound, radically curable composition, cured product of the same, and resist-material composition

Phenolic hydroxyl group-containing resin, production method therefor, photosensitive composition, resist material, coating film, curable composition and cured product thereof, and resist underlayer film

Phenolic-hydroxyl-group-containing novolac resin and resist film

Novolac-type phenolic hydroxyl group-containing resin, production method therefor, curable composition, composition for resist, and color resist

IMADA TOMOYUKI

Positive photoresist composition, coating film thereof, and novolac phenol resin

Positive-type photoresist composition

Polyether ester composition, polyurethane resin composition, and optical material using the same

Radically curable compound, cured product thereof, and method for producing the compound

KOMATSU MFG CO LTD

Controller assembly, cab for work machine, and work machine